Latest issues
- 2026,Volume 19Issue 1.1 Full text
- 2026,Volume 19Issue 1
- 2025,Volume 18Issue 4.1 Full text
- 2025,Volume 18Issue 4
Effect of FIB-modification of Si (111) surface on GaAs nanowire growth
- Year: 2022
- Volume: 15
- Issue: 3.3
- 16
- 5699
- Pages: 36-41
Multistage droplet epitaxy for the fabrication of InAs/GaAs quantum dots with ultra-low density
- Year: 2022
- Volume: 15
- Issue: 3.3
- 13
- 5910
- Pages: 42-47
Experimental study of nanoholes formation using local droplet etching of FIB-modified GaAs (001) surface
- Year: 2022
- Volume: 15
- Issue: 3.3
- 19
- 5573
- Pages: 48-53
Effect of pregrowth annealing temperature on the subsequent epitaxial growth of GaAs on Si
- Year: 2022
- Volume: 15
- Issue: 3.3
- 24
- 5551
- Pages: 54-58
Study of FIB-modified silicon areas by AFM and Raman spectroscopy
- Year: 2022
- Volume: 15
- Issue: 3.3
- 23
- 5550
- Pages: 59-63
Independent control of size and shape of GaAs nanostructures during droplet epitaxy using ultra-low arsenic flux
- Year: 2022
- Volume: 15
- Issue: 3.3
- 19
- 5656
- Pages: 315-319
Effect of plasma-chemical treatment of Si (001) substrates on the subsequent epitaxial growth of GaAs
- Year: 2023
- Volume: 16
- Issue: 3.1
- 23
- 4561
- Pages: 122-127
Control of properties and geometric characteristics of selectively formed GaAs nanowires within the FIB treatment area on Si (111)
- Year: 2024
- Volume: 17
- Issue: 3.1
- 20
- 3194
- Pages: 28-33
Combined approach of patterning on SiO2/Si substrate using ion beam and chemical wet etching
- Year: 2024
- Volume: 17
- Issue: 3.1
- 16
- 3099
- Pages: 75-78
Ordered GaAs NW growth on Si (111) substrates modified by two-step FIB treatment
- Year: 2025
- Volume: 18
- Issue: 3.1
- 10
- 800
- Pages: 19-22
Localized Ga droplets formation on nanopatterned silicon substrates
- Year: 2025
- Volume: 18
- Issue: 3.2
- 6
- 685
- Pages: 57-59
Formation of site-controlled InAs quantum dots on nanopatterned GaAs (111)B surfaces
- Year: 2025
- Volume: 18
- Issue: 3.2
- 5
- 720
- Pages: 115-118

