Fabrication of nanoscale structures by FIB-induced deposition of materials and study of their electrical properties

Methods of local formation of nanoscale structures based on the application of focused ion beam open up new possibilities in terms of providing the necessary geometric parameters and ensuring the reproducibility of micro- and nanostructures, which contributes to the development of devices with previously unattainable characteristics. This paper presents the technological modes of formation of nanostructures with a height of 1 μm and diameters from 100 to 500 nm by the FIB method. The structures were formed by ion-induced deposition of carbon and tungsten, as well as electron-induced deposition of tungsten. A method for measuring the electrical parameters of high-aspect ratio structures based on an atomic force microscope (AFM) was proposed. The current value of 25 nA was obtained at 50 V. Threshold voltages for various nanostructures ranged from 7 to 32 V. The stability of structures to the electric field at voltages up to 50 V was investigated.