A facile low-temperature approach for organics removal from SiO2-CTAB mesoporous particles

Physical materials technology
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Abstract:

A simple, fast and efficient method has been developed for removing pore-forming organic substances from MCM-41 type materials without affecting their shape, structural and adsorption characteristics. The method is based on express annealing of the synthesized silica materials in vacuum at low temperatures. It was shown that the synthesized particles do not sinter during annealing in vacuum and are monodisperse and aggregatively stable.