Novel methods for synthesizing high-quality thin films through short and ultrashort high-power pulsed magnetron sputtering

The present study focuses on investigating the increase in average ion current density to the substrate in short and ultra-short high-power impulse magnetron sputtering (HiPIMS). Theoretical and experimental evidence demonstrates that, while maintaining the average power level of HiPIMS, the ultra-short mode enables a more than threefold increase in the ion current density of the target material onto the substrate. These findings hold promise for enhancing the quality of HiPIMS ion-plasma vapor deposition (IPVD) coatings.