Methods for processing field emission glow patterns to obtain the I-V characteristics of individual emission sites

The work describes the features of processing glow patterns of the field emission projector when obtaining local I-V characteristics of individual emission sites. The features of constructing such dependencies are shown with the example of an experiment with a nanocomposite field emitter. The main factors influencing the analysis of glow patterns are discussed: the illumination effect, the halo effect, adsorption-desorption processes, vacuum discharges, burnout and contamination of the phosphor screen. Algorithms for reducing these effects with the computer processing of experimental data are described.