Optimizing deposition regimes to fabricate vanadium dioxide film for active metasurfaces

Physical materials technology
Authors:
Kutepov Maxim E. Domaratskiy Ivan K. Zhukov Sergey S. Kaidashev Evgeni M. Lisnevskaya Inna V. Abdulvakhidov Kamaludin G. Kaydashev Vladimir E.
Abstract:

Several deposition protocols to obtain epitaxial VO2 films from metallic vanadium and VO2 targets are compared. Films obtained from VO2 target showed much smoother and droplet free surface compared to those prepared from V target. The samples prepared from oxide target in average showed larger middle IR reflection of 55–67% in conducting state compared to ~ 56% for samples obtained from metal V target.