<?xml version="1.0" encoding="utf-8"?>
<journal>
  <titleid/>
  <issn>2304-9782, 2618-8686, 2405-7223</issn>
  <journalInfo lang="ENG">
    <title>St. Petersburg Polytechnic University Journal: Physics and Mathematics</title>
  </journalInfo>
  <issue>
    <volume>18</volume>
    <number>3.1</number>
    <altNumber> </altNumber>
    <dateUni>2025</dateUni>
    <pages>1-319</pages>
    <articles>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>12-18</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Romashkin</surname>
              <initials>Alexey</initials>
              <email>romaleval@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-5063-1669</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Rozanov</surname>
              <initials>Roman</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-4024-5411</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Vishnevskiy</surname>
              <initials>Alexey</initials>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Mitrofanova </surname>
              <initials>Anastasia</initials>
              <email>mitrofanova.ae@phystech.edu</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Stebelkov</surname>
              <initials>Artem</initials>
              <email>stebelkov@zntc.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Nepomilueva</surname>
              <initials>Valeriya</initials>
              <email>valeria.nepomilueva@yandex.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Levin</surname>
              <initials>Denis</initials>
              <email>vkn@miee.ru</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Svetikov</surname>
              <initials>Vladimir</initials>
              <email>vl.svetikov@gmail.com</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <orgName>National Research University of Electronic Technology</orgName>
              <surname>Nevolin</surname>
              <initials>Vladimir</initials>
              <email>vkn@miee.ru</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Comparison of the refractive index changes of nanolayers of amidated and carboxylated carbon nanotubes after adsorption of water and ammonia molecules</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Spray-deposited layers of amidated carbon nanotubes (ACNTs) were characterized using AFM, Raman scattering, and spectroscopic ellipsometry. The layer thickness, diameters, and band gap of ACNTs, as well as the changes in the refractive index (n) at 1319 nm and 1625 nm after H2O and NH3 adsorption in air and H2O in N2 were analyzed in comparison with carboxylated CNTs. Modeling the resonance peak shift due to changes in n for the ACNT-coated Si waveguide microring resonator after NH3 adsorption allows us to propose the use of such a CNT layer set for integrated optical sensors for gas recognition tasks.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.101</doi>
          <udk>[621.793:621.315.5+544.164]::535.93::681.586</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>carbon nanotube</keyword>
            <keyword>ellipsometry</keyword>
            <keyword>integrated optics</keyword>
            <keyword>microring resonator</keyword>
            <keyword>sensor</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.1/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>19-22</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Shandyba </surname>
              <initials>Nikita </initials>
              <email>shandyba.nikita@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Eremenko</surname>
              <initials>Mikhail</initials>
              <email>eryomenko@sfedu.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-6762-2053</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Southern Federal University</orgName>
              <surname>Dukhan </surname>
              <initials>Denis </initials>
              <email>duhan@sfedu.ru </email>
              <address>Taganrog, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Chernenko </surname>
              <initials>Natalia</initials>
              <email>nchernenko@sfedu.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Kirichenko </surname>
              <initials>Danil </initials>
              <email>dankir@sfedu.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0009-0001-5183-5396</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kugaevsky</surname>
              <initials>Alexander</initials>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <orgName>National Research University ‘Higher School of Economics”</orgName>
              <surname>Makhov</surname>
              <initials>Ivan</initials>
              <email>imahov@hse.ru</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Kryzhanovskaya Natalia V.</surname>
              <initials>Natalia</initials>
              <email>nkryzhanovskaya@hse.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <surname>Balakirev</surname>
              <initials>Sergey</initials>
              <email>sbalakirev@sfedu.ru</email>
            </individInfo>
          </author>
          <author num="010">
            <individInfo lang="ENG">
              <surname>Solodovnik</surname>
              <initials>Maxim</initials>
              <email>solodovnikms@sfedu.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Ordered GaAs NW growth on Si(111) substrates modified by two-step FIB treatment</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">This work demonstrates, for the first time, the selective formation of ordered arrays of vertical GaAs nanowires on Si(111) with a native oxide layer using a two-step pre-treatment of the substrate surface with a focused Ga-ion beam. Based on our previous studies, we show that modifying the substrate through a two-step protocol — first applying a continuous surface treatment with low doses (up to 1×10–13 C/µm2), followed by spot treatment with medium doses (from 1×10–13 to 1×10–12 C/µm2) — effectively suppresses parasitic growth and enables nanowire formation at defined surface locations. Furthermore, adjusting the spacing between ion implantation points (from 0.5 to 5 um) allows precise control over the pitch of the nanowire array. By optimizing dose values, we achieve the formation of single, free-standing, vertically oriented nanowires at each ion beam impact site. The study of optical properties of nanowire arrays reveals their high structural quality, as evidenced by intense photoluminescence of GaAs up to room temperatures.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.102</doi>
          <udk>538.975</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>silicon</keyword>
            <keyword>focused ion beam</keyword>
            <keyword>molecular beam epitaxy</keyword>
            <keyword>nanowires</keyword>
            <keyword>III-V</keyword>
            <keyword>nanopatterning</keyword>
            <keyword>site-controlled</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.2/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>23-29</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Babenko</surname>
              <initials>Sofiya</initials>
              <email>sofi.bb@yandex.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Bryleva</surname>
              <initials>Anna</initials>
              <email>anniebryleva@yandex.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Kanaev</surname>
              <initials>Kirill</initials>
              <email>kir-kv2005@mail.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Kudryavtsev</surname>
              <initials>Oleg</initials>
              <email>oleg6565657@gmail.com</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Nigmatullina</surname>
              <initials>Razalina</initials>
              <email>razalina.n2004@gmail.com</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Rayanova</surname>
              <initials>Kamilla</initials>
              <email>raanovakamilla@gmail.com</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Sudakova</surname>
              <initials>Alexandra</initials>
              <email>asudakova12@gmail.com</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Trukhanova</surname>
              <initials>Mariya</initials>
              <email>trukhanova@physics.msu.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <surname>Komarov </surname>
              <initials>Ivan</initials>
              <email>master_kom@mail.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Thin reduced graphene oxide based films for nanoelectronics and sensors</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Formation of new devices of flexible and organic electronics requires new materials. One of the perspective classes of materials is graphene derivatives. To enhance wettability of polymer substrates we used multicomponent graphene oxide suspension with further reduction of obtained films with laser irradiation. We used UV and IR lasers for local reduction of these films to form transistors and biosensors. Graphene oxide film from 0.93 mg/ml suspension with lacquer thinner was successfully deposited and reduced for BGTE transistor formation. Reduced graphene oxide film acted as an n-type semiconductor with 2–8×10−3 cm2/V·s−1 mobility.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.103</doi>
          <udk>620.3</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>contact angle</keyword>
            <keyword>dispersion medium</keyword>
            <keyword>graphene oxide</keyword>
            <keyword>reduced graphene oxide</keyword>
            <keyword>thin films</keyword>
            <keyword>transistor</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.3/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>30-35</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0008-4344-4863</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Nikolaeva</surname>
              <initials>Aleksandra</initials>
              <email>nikalex2000@bk.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <orgName>Center for Photonics and 2D Materials</orgName>
              <surname>Anikina</surname>
              <initials>Maria</initials>
              <email>mari.a.nikina@yandex.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-3469-5897</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Kondratev</surname>
              <initials>Valeriy</initials>
              <email>kvm_96@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Sharov</surname>
              <initials>Vladislav</initials>
              <email>vl_sharov@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <orgName>Moscow Institute of Physics and Technology (MIPT)</orgName>
              <surname>Barulina</surname>
              <initials>Elena</initials>
              <email>e.barulina@rqc.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Gridchin </surname>
              <initials>Vladislav</initials>
              <email>gridchinvo@gmail.com</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <orgName>St. Petersburg State University</orgName>
              <surname>Khrebtov</surname>
              <initials>Artem</initials>
              <email>khrebtovart@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="008">
            <authorCodes>
              <orcid>0000-0002-5376-5555</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Far Eastern Federal University</orgName>
              <surname>Kuchmizhak</surname>
              <initials>Aleksandr</initials>
              <email>alex.iacp.dvo@mail.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <authorCodes>
              <orcid>0000-0001-7223-7232</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Moscow Institute of Physics and Technology (National Research University)</orgName>
              <surname>Bolshakov</surname>
              <initials>Alexey</initials>
              <email>acr1235@mail.ru</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Hybrid emitters based on two-dimensional WSe2 and ordered plasmonic nanobumps</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Two-dimensional transition metal dichalcogenides (TMDs), particularly tungsten diselenide (WSe2), exhibit exceptional optoelectronic properties, including strong light-matter interactions and tunable exciton behavior, making them promising for nanophotonic applications. This work investigates a hybrid system comprising a WSe2 monolayer integrated with a plasmonic metasurface of Au-nanobumps to enhance photoluminescence (PL) through exciton-plasmon coupling and strain-induced bandgap modulation. The WSe2 monolayers were&#13;
mechanically exfoliated and transferred onto a laser-patterned Au-nanobump array fabricated via femtosecond laser printing, offering a scalable alternative to conventional lithography. Optical characterization showed a threefold enhancement of photoluminescence intensity of WSe2 monolayer lying on a nanobump compared to WSe2 on a flat gold substrate, what attributed to localized plasmon-exciton interactions and strain effects. The study demonstrates a cost-effective, lithography-free approach for tailoring hybrid TMD-plasmonic systems, enabling precise control over optical properties for next-generation optoelectronic devices.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.104</doi>
          <udk>535.372</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>WSe2</keyword>
            <keyword>emitter</keyword>
            <keyword>nanobump</keyword>
            <keyword>photoluminescence</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.4/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>36-39</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Subbotin</surname>
              <initials>Evgenii </initials>
              <email>jons712@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Kozlov</surname>
              <initials>Aleksei</initials>
              <email>kozlov.ag@dvfu.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0001-8726-5615</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Institute of Automation and Control Processes FEB RAS</orgName>
              <surname>Pavlov</surname>
              <initials>Dmitrii</initials>
              <email>pavlov.dim@mail.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0009-0007-5206-5753</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Lisenkov</surname>
              <initials>Oleg</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0000-4799-002X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Udilov</surname>
              <initials>Andrei</initials>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Goroshko</surname>
              <initials>Dmitrii </initials>
              <email>goroshko@iacp.dvo.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <orgName>Institute of Nanotechnologies of Microelectronics of the RAS</orgName>
              <surname>Poliakov</surname>
              <initials>Maxim</initials>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Volkova </surname>
              <initials>Lidiya </initials>
              <email>lidiya.volkova.96@mail.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <authorCodes>
              <orcid>0009-0008-0181-8994</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Prokopeva</surname>
              <initials>Glikeriya</initials>
            </individInfo>
          </author>
          <author num="010">
            <authorCodes>
              <orcid>0000-0002-8726-9832</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Institute of Automation and Control Processes, Far Eastern Branch of the RAS</orgName>
              <surname>Chernev</surname>
              <initials>Igor</initials>
              <email>igor_chernev7@mail.ru</email>
            </individInfo>
          </author>
          <author num="011">
            <authorCodes>
              <orcid>0009-0007-4827-2653</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Khoroshilov</surname>
              <initials>Dmitry</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Synthesis of Mg2Si-based core-shell nanowires</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In this work, we proposed the method for synthesis of nanowires with Mg2Si/Sibased core-shell heterostructure. Silicon nanowires acting as a source of silicon for the silicification reaction were obtained by well-studied metal-stimulated chemical etching of silicon with orientation (100) doped with boron, with a resistivity of 1–10 Ω×cm. A 30 nm thick gold film&#13;
with an adhesive titanium sublayer 1.5 nm thick was used as the catalytic metal. The etched nanowires had a height of ~10 microns and a diameter of 1.5 microns. The Mg2Si shell was&#13;
formed using the solid-phase epitaxy method under ultrahigh vacuum conditions. The thickness of the silicide shell was 400–600 nm on the side surfaces of the nanowires.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.105</doi>
          <udk>538.9</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>silicon</keyword>
            <keyword>magnesium silicide</keyword>
            <keyword>epitaxy</keyword>
            <keyword>nanowires</keyword>
            <keyword>core-shell</keyword>
            <keyword>thermoelectricity</keyword>
            <keyword>MACE</keyword>
            <keyword>SEM</keyword>
            <keyword>EDX</keyword>
            <keyword>TEM</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.5/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>40-43</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Subbotin</surname>
              <initials>Evgenii </initials>
              <email>jons712@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0000-4799-002X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Udilov</surname>
              <initials>Andrei</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0009-0008-0181-8994</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Prokopeva</surname>
              <initials>Glikeriya</initials>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Goroshko</surname>
              <initials>Dmitrii </initials>
              <email>goroshko@iacp.dvo.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Kozlov</surname>
              <initials>Aleksei</initials>
              <email>kozlov.ag@dvfu.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0002-8726-9832</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Institute of Automation and Control Processes, Far Eastern Branch of the RAS</orgName>
              <surname>Chernev</surname>
              <initials>Igor</initials>
              <email>igor_chernev7@mail.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <orcid>0009-0007-5206-5753</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Lisenkov</surname>
              <initials>Oleg</initials>
            </individInfo>
          </author>
          <author num="008">
            <authorCodes>
              <orcid>0009-0007-4827-2653</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Khoroshilov</surname>
              <initials>Dmitry</initials>
            </individInfo>
          </author>
          <author num="009">
            <authorCodes>
              <orcid>0009-0002-7285-3224</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Sinotova</surname>
              <initials>Sofia</initials>
            </individInfo>
          </author>
          <author num="010">
            <authorCodes>
              <orcid>0000-0003-4127-2988</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Institute of Automation and Control Processes, Far Eastern Branch of the RAS</orgName>
              <surname>Galkin</surname>
              <initials>Nikolay</initials>
              <email>galkin@iacp.dvo.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Influence of the growth regime on the transport properties of doped Mg2Si films</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In this work, we studied transport properties of the doped Mg2Si film on silicon substrate. The ~1 µm-thickness film was synthesized by the solid phase epitaxy method. Well-proven Ag was chosen as a dopant. At room temperature, the resistivity was 2 Ω×cm, the mobility was 327 cm2/(V×s), the density was 9.3×1015 cm−3. We established that using the solid phase epitaxy with the low temperature annealing regime led to mixed electron conductivity of the doped Mg2Si:Ag film due to the substitution of Si-site by Ag. The activation energy of the donor level is 24 meV.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.106</doi>
          <udk>538.9</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>silicon</keyword>
            <keyword>magnesium silicide</keyword>
            <keyword>solid phase epitaxy</keyword>
            <keyword>silver</keyword>
            <keyword>Hall-measurements</keyword>
            <keyword>SEM</keyword>
            <keyword>EDX</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.6/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>44-47</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-1744-5976</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University, RAS</orgName>
              <surname>Terpitskiy</surname>
              <initials>Aleksey</initials>
              <email>terpiczkij@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Reshetov</surname>
              <initials>Ilya</initials>
              <email>reshetov_iv@spbstu.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Scherbak</surname>
              <initials> Sergey </initials>
              <email>sergeygtn@yandex.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>Alferov University </orgName>
              <surname>Lipovskii</surname>
              <initials>Andrey</initials>
              <email>lipovskii@mail.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Visualization of electric field of e-beam-formed charge patterns in glass</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">We have formed a given pattern of the second order optical nonlinearity in the&#13;
subsurface region of a glass by electron irradiation. The nonlinearity was induced by the electric&#13;
field of the electrons captured by the glass. Formed structure consisted of periodic “strips” and,&#13;
being irradiated normally to the glass surface with an IR laser, generated the second harmonic&#13;
(SH) radiation pattern similar to one of a phase diffraction grating. The pattern presented the&#13;
results of an interference of the SH waves generated by nonlinear strips. Mapping of the SH&#13;
radiation pattern in orthogonal polarizations of the fundamental laser beam allowed concluding&#13;
about the distribution of the electric field of electrons captured in the glass.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.107</doi>
          <udk>538.958</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>second harmonic generation</keyword>
            <keyword>glass</keyword>
            <keyword>e-beam lithography</keyword>
            <keyword>grating structure</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.7/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>48-52</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0003-2498-1192</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>I.N. Ulyanov Chuvashia State University</orgName>
              <surname>Lepaev</surname>
              <initials>Alexander</initials>
              <address>Cheboksary, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0002-9723-5652</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>I.N. Ulyanov Chuvashia State University</orgName>
              <surname>Ksenofontov</surname>
              <initials>Sergey</initials>
              <address>Cheboksary, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0001-8432-5635</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>I.N. Ulyanov Chuvashia State University</orgName>
              <surname>Vasilyeva </surname>
              <initials>Olga </initials>
              <address>Cheboksary, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0002-9810-6932</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kudryavtsev</surname>
              <initials>Andrey</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Influence of physical effects on the structure of soot particles of hydrocarbon flames</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The structure of the diffusion flame of TC-1 kerosene has been studied. A film of pyrolytic soot was obtained using the sampling method, and the structural changes of this film under thermal exposure were studied. A new carbon structure – glass carbon was obtained as a result of laser irradiation of highly dispersed carbon black. The mechanism of bubble formation in the glassy carbon structure has been established, and the latent heat of carbon “melting” equal to 2110 J/kg has been determined.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.108</doi>
          <udk>536.46</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>flame</keyword>
            <keyword>soot</keyword>
            <keyword>carbon</keyword>
            <keyword>pyrolysis</keyword>
            <keyword>IR-spectroscopy</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.8/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>53-58</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-8726-9832</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Institute of Automation and Control Processes, Far Eastern Branch of the RAS</orgName>
              <surname>Chernev</surname>
              <initials>Igor</initials>
              <email>igor_chernev7@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Subbotin</surname>
              <initials>Evgenii </initials>
              <email>jons712@mail.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Kozlov</surname>
              <initials>Aleksei</initials>
              <email>kozlov.ag@dvfu.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0009-0002-7285-3224</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Sinotova</surname>
              <initials>Sofia</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0006-2778-8143</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Prikhodchenko</surname>
              <initials>Alena</initials>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0003-0436-0612</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Lembikov</surname>
              <initials>Aleksei</initials>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <orcid>0009-0008-0181-8994</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Prokopeva</surname>
              <initials>Glikeriya</initials>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Goroshko</surname>
              <initials>Dmitrii </initials>
              <email>goroshko@iacp.dvo.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <authorCodes>
              <orcid>0000-0003-4127-2988</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Institute of Automation and Control Processes, Far Eastern Branch of the RAS</orgName>
              <surname>Galkin</surname>
              <initials>Nikolay</initials>
              <email>galkin@iacp.dvo.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Si-based photodetector with an Mg2Si contact layer for SWIR range</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Mg2Si film ~2.3 μm was synthesized by reactive deposition Mg on Si(111) at 340 °C in UHV. The photoresponse of backlighted Al/Si/Mg2Si Schottky structure represents the bell-shaped curve with the peak at 1045 nm and intensity 29 mA/W, 105 mA/W and 195 mA/W under the 0 V, 1 V and 5 V bias respectively with FWHM ~130 nm.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.109</doi>
          <udk>539.23+539.25+539.26+537.32+537.9</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>magnesium silicide</keyword>
            <keyword>silicon</keyword>
            <keyword>films</keyword>
            <keyword>epitaxy</keyword>
            <keyword>reactive epitaxy</keyword>
            <keyword>crystal structure</keyword>
            <keyword>microscopy</keyword>
            <keyword>photoresponse</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.9/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>59-64</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <orgName>Voronezh State University of Engineering Technology</orgName>
              <surname>Kim </surname>
              <initials>Kseniya </initials>
              <email>kmkseniya@yandex.ru</email>
              <address>Voronezh, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0005-4323-9163</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Chernenko</surname>
              <initials>Sergey</initials>
              <email>sergey.x173@mail.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>Voronezh State University of Engineering Technology</orgName>
              <surname>Niftaliev</surname>
              <initials>Sabukhi</initials>
              <email>sabukhi@gmail.com</email>
              <address>Voronezh, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0009-0000-2880-8958</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Frolova</surname>
              <initials>Vera</initials>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <orgName>Voronezh State University</orgName>
              <surname>Grechkina</surname>
              <initials>Margarita</initials>
              <email>grechkina_m@mail.ru</email>
              <address>Voronezh, Russian Federation</address>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0002-9850-8341</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Grigoryan</surname>
              <initials>Gevorg</initials>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Belokopytov</surname>
              <initials>Dmitry</initials>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Chukavin</surname>
              <initials>Andrey</initials>
              <email>andrey_chukawin@mail.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <orgName>Voronezh State University of Engineering Technology</orgName>
              <surname>Lenshin</surname>
              <initials>Alexander</initials>
              <email>lenshinas@mail.ru</email>
              <address>Voronezh, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Copper deposition onto porous silicon by vacuum thermal evaporation</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The morphology and composition of porous silicon samples with thermally evaporated copper coatings were studied using atomic-force microscopy (AFM), infrared spectroscopy (IR), and X-ray photoelectron spectroscopy (XPS). Our research demonstrated that nanocomposites obtained with this method involve both metallic copper and copper oxide. The results indicate that vacuum thermal deposition of copper promotes efficient penetration of this element into the porous silicon structure and retards the oxidation process of the porous layer during long-term storage in the atmosphere.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.110</doi>
          <udk>546.3-126:544.2</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>porous silicon</keyword>
            <keyword>composites</keyword>
            <keyword>thin films</keyword>
            <keyword>copper</keyword>
            <keyword>vacuum-thermal sputtering</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.10/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>65-70</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <orgName>National Research University of Electronic Technology</orgName>
              <surname>Vasilevsky </surname>
              <initials>Pavel </initials>
              <email>pavelvasilevs@yandex.ru</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <orgName>National Research University of Electronic Technology</orgName>
              <surname>Savelyev</surname>
              <initials>Mikhail</initials>
              <email>nanonlin@yandex.ru</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>National Research University of Electronic Technology</orgName>
              <surname>Gerasimenko</surname>
              <initials>Alexander</initials>
              <email>gerasimenko@bms.zone</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Nonlinear absorption of laser radiation in the carbon nanotubes dispersions in ultraviolet and visible ranges</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Carbon nanotubes have unique properties and applications in various fields such as nonlinear optics, flexible electronics, biocompatible composites for tissue repair, etc. The properties of carbon nanotubes can be tuned when exposed to laser radiation. The manifestation of nonlinear absorption properties can improve the methods of formation and processing of materials containing carbon nanotubes. In this work, the properties of nonlinear absorption in the ultraviolet (355 nm) and visible (532 nm) ranges depending on the type of carbon nanotubes and the type of solvent are investigated. The study was performed using the Z-scan method with pulsed exposure (pulse duration is 20 ns). It was shown that the homogeneity of the carbon nanotubes distribution in a liquid medium affects the nonlinear absorption of laser radiation. Single-walled carbon nanotubes in dimethylformamide showed the best nonlinear absorption coefficient and the lowest threshold fluence when the interaction of the medium with laser radiation becomes nonlinear. The demonstrated laser stability of nanotubes also makes them a promising material for laser radiation limiters and nonlinear optical switchers.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.111</doi>
          <udk>535.015</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>laser radiation</keyword>
            <keyword>nonlinear absorption</keyword>
            <keyword>carbon nanotubes</keyword>
            <keyword>UV range</keyword>
            <keyword>visible range</keyword>
            <keyword>nanosecond pulses</keyword>
            <keyword>Z-scan</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.11/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>71-76</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-5760-1523</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Sosunov </surname>
              <initials>Aleksei </initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0002-3110-668X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Petukhov</surname>
              <initials>Igor</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-8267-0168</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kornilicyn</surname>
              <initials>Andrey</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0003-3053-1892</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Mololkin</surname>
              <initials>Anatoliy</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0006-1447-3310</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Umylin</surname>
              <initials>Vladislav</initials>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0003-1077-7975</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Fakhrtdinov</surname>
              <initials>Rashid</initials>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <orcid>0000-0002-6040-6403</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kulikov</surname>
              <initials>Anton</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Annealed proton-exchange waveguides in mixed lithium niobate-tantalate solid solutions</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Annealed proton-exchange (APE) waveguides in lithium niobate are widely used in integrated photonics for navigation, telecommunications and electric field sensors. In this paper, we analyze the characteristics of planar APE waveguides in new mixed single crystals of lithium niobate-tantalate solid solution by various methods (prism coupling, XRD and IR spectroscopy). The elemental composition (ratio Nb/Ta) of Z-cut mixed lithium niobate-tantalate samples gives a good uniform distribution over the all-surface area by X-ray fluorescence method. APE waveguides in mixed lithium niobate-tantalate single crystals are characterized by a lower value of refractive index increment due to Ta atoms and higher proton diffusion coefficients due to lattice disordering. High diffusion coefficients provide a deeper APE waveguide layer and rapid recovery of the crystal lattice during post-exchange annealing. These results expand the understanding of the proton exchange process in mixed lithium niobate-tantalate solid solutions for the creation of single-mode APE waveguides.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.112</doi>
          <udk>535.3, 544.015</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>optical materials</keyword>
            <keyword>lithium niobate-tantalate</keyword>
            <keyword>APE waveguides</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.12/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>77-80</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0005-0782-8569</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Moroz</surname>
              <initials>Alexey</initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-9602-9868</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Chistikov</surname>
              <initials>Ilia</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0003-3741-3936</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Ioffe Physical Technical Institute of the Russian Academy of Sciences</orgName>
              <surname>Melehin </surname>
              <initials>Vladimir </initials>
              <email>melekhin1952@gmail.com</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>Peter the Great St. Petersburg Polytechnic University Alferov University</orgName>
              <surname>Kaasik </surname>
              <initials>Vladimir </initials>
              <email>vkaasik@yandex.ru </email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Thermal poling of photosensitive glasses containing Ag+ and Ce3+ ions</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">We present the results on the crystallization of photo-thermo-refractive glass under thermal poling and ultraviolet (UV) irradiation followed by heat treatment. Poling was carried out at a temperature of 300 °C and a voltage of 400−1000 V. A femtosecond laser with a wavelength of 343 nm was used as UV sources. The studies were carried out using optical microscopy, optical absorption and Raman scattering. It is shown that in the subanode layer of the glass after poling, subsequent UV irradiation and heat treatment, crystallization of glass is completely suppressed. After the poling and the heat treatment cesium ions are also recharged in this layer Ce3+ → Ce4+. The mechanisms of the crystallization suppression and ion recharge in the poled region of the glass are discussed.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.113</doi>
          <udk>53.043</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>photosensitive glass</keyword>
            <keyword>thermal poling</keyword>
            <keyword>UV irradiation</keyword>
            <keyword>heat treatment</keyword>
            <keyword>crystallization</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.13/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>81-84</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-3469-5897</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Kondratev</surname>
              <initials>Valeriy</initials>
              <email>kvm_96@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-6869-1213</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Vyacheslavova</surname>
              <initials>Ekaterina</initials>
              <email>cate.viacheslavova@yandex.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-4110-1647</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Shugabaev</surname>
              <initials>Talgat</initials>
              <email>talgashugabaev@mail.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0001-7223-7232</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Moscow Institute of Physics and Technology (National Research University)</orgName>
              <surname>Bolshakov</surname>
              <initials>Alexey</initials>
              <email>acr1235@mail.ru</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Modification of silicon nanowires with silver nanoparticles for gas sensor applications</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">This study focuses on methods to modify the adsorption properties of silicon nanowires produced through plasma cryogenic etching. This research demonstrates the potential for synthesizing a nanocomposite composed of silicon nanowires and silver nanoparticles, which can be utilized to develop highly efficient gas sensors.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.114</doi>
          <udk>538.91</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>nanowires</keyword>
            <keyword>selective adsorption sensor</keyword>
            <keyword>electrical impedance spectroscopy</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.14/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>85-90</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-5183-6807</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Vasilevskaya </surname>
              <initials>Yulia </initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0006-1375-6191</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Chumachenko</surname>
              <initials>Julia</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Aggregation kinetics of silver nanoparticles ensembles in sub-percolating state and its impact on memristive behaviour</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The effect of coalescence and aggregation processes on the memristive properties of silver nanoparticle assemblies has been investigated. Nanoparticles were prepared by vacuum-thermal evaporation on silicon substrates with gold electrodes and quartz glasses for morphological control. The structure of the samples and size distribution of nanoparticles were studied using scanning electron microscopy (SEM) and UV-visible spectroscopy. Memristive properties were estimated using cyclic voltammetry. Due to Ostwald ripening and an increase in average nanoparticle size, the operating voltage required to switch the system into the memristive state decreased, while the conductivity dynamics changed. These findings are useful for ensuring the stability of memristive devices based on silver nanoparticle assemblies.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.115</doi>
          <udk>539.219.3</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>coalescence</keyword>
            <keyword>silver nanoparticles</keyword>
            <keyword>surface plasmon resonance</keyword>
            <keyword>memristive dynamics</keyword>
            <keyword>surface diffusion</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.15/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>91-94</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-4513-6345</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>ITMO University</orgName>
              <surname>Ruzhevich</surname>
              <initials>Maxim</initials>
              <email>max.ruzhevich@niuitmo.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0007-1056-5100</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>ITMO University</orgName>
              <surname>Kirilenko</surname>
              <initials>Iaroslav </initials>
              <email>idkirilenko@itmo.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>St. Petersburg Electrotechnical University "LETI"</orgName>
              <surname>Chumanov </surname>
              <initials>Ivan </initials>
              <email>chumanov2000@yandex.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>St. Petersburg Electrotechnical University "LETI"</orgName>
              <surname>Firsov</surname>
              <initials>Dmitrii</initials>
              <email>d.d.firsov@gmail.com</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <orgName>St. Petersburg Electrotechnical University "LETI"</orgName>
              <surname>Komkov </surname>
              <initials>Oleg </initials>
              <email>oleg_sergeevich@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Mynbaev</surname>
              <initials>Karim</initials>
              <email>mynkad@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <orcid>0000-0002-9989-3843</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Romanov</surname>
              <initials>Viacheslav</initials>
              <email>romanovvv@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Moiseev</surname>
              <initials>Konstantin</initials>
              <email>mkd@iropt2.ioffe.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Optical studies of InAs/InAsSb/InAsSbP heterostructures</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Fourier-transform infrared photoluminescence and photoreflectance were used to study the optical properties of InAs/InAsSbP and InAs/InAsSb/InAsSbP heterostructures. A strong dependence of chemical composition and optical quality of the top InAsSbP barrier layers on the composition of the material on which the layer was grown has been established.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.116</doi>
          <udk>538.91</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>heterostructures</keyword>
            <keyword>InAsSbP</keyword>
            <keyword>photoluminescence</keyword>
            <keyword>photoreflectance</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.16/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>95-98</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0004-1245-1391</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Voitovich </surname>
              <initials>Veronica</initials>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <orgName>National Research University ‘Higher School of Economics”</orgName>
              <surname>Makhov</surname>
              <initials>Ivan</initials>
              <email>imahov@hse.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>ITMO University</orgName>
              <surname>Andryushkin</surname>
              <initials>Vladislav</initials>
              <email>vvandriushkin@itmo.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Kopytov</surname>
              <initials>Pavel</initials>
              <email>kopytovpe@itmo.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0001-3683-5558</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>ITMO University</orgName>
              <surname>Papylev</surname>
              <initials>Denis</initials>
              <email>dspapylev@itmo.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Kryzhanovskaya Natalia V.</surname>
              <initials>Natalia</initials>
              <email>nkryzhanovskaya@hse.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <scopusid>35379962200</scopusid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Ioffe Physical Technical Institute of the Russian Academy of Sciences</orgName>
              <surname>Zhukov</surname>
              <initials>Alexey</initials>
              <email>zhukov@beam.ioffe.ru</email>
              <address>Russia, 194021, St.Petersburg, Polytechnicheskaya 26</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Photoluminescence of InGaAs/InAlAs short-period superlattices grown on InP substrate</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The photoluminescence spectra of short-period InGaAs/InAlAs superlattices&#13;
emitting in the 1.3 µm spectral range were investigated in the wide range of pumping powers&#13;
at the temperatures of 5−300 K. The 5 K photoluminescence spectra consisted of luminescence&#13;
bands associated with radiative electron-hole recombination in superlattices as well as in the&#13;
InP substrate and buffer layers of heterostructures. Spectral positions of superlattice emission&#13;
bands are in a good agreement with calculated values obtained with transfer matrix method for&#13;
all the samples. The temperature evolution of emission spectra was investigated as well.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.117</doi>
          <udk>535.3</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>superlattice</keyword>
            <keyword>photoluminescence</keyword>
            <keyword>VCSEL</keyword>
            <keyword>temperature quenching</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.17/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>99-104</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <orgName>Voronezh State University of Engineering Technology</orgName>
              <surname>Lenshin</surname>
              <initials>Alexander</initials>
              <email>lenshinas@mail.ru</email>
              <address>Voronezh, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0003-0123-9526</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Polkovnikova</surname>
              <initials>Yulia</initials>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>Voronezh State University of Engineering Technology</orgName>
              <surname>Chernousova</surname>
              <initials>Olga</initials>
              <email>byolval@mail.ru</email>
              <address>Voronezh, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0009-0000-2880-8958</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Frolova</surname>
              <initials>Vera</initials>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Domashevskaya</surname>
              <initials>Evelina</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Composition and properties of porous silicon nanoparticles with deposited cinnarizine</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">As a result of our work samples of nanopowders of porous silicon with the deposited cinnarizine were obtained and technique of the chemical deposition of cinnarizine into the porous layer was elaborated. The obtained structures of porous silicon can be used for delivery of various therapeutic agents starting from small molecules of the preparations up to the large peptides/protein therapeutic agents while controlling composition of the surface and morphology of the porous layer. Nanopowder of porous silicon was obtained by mechanical and ultrasound grinding of the porous silicon wafers. Using transmission electron microscopy, infrared and ultraviolet spectroscopy morphology and composition of the porous silicon samples were studied. According to the results of transmission electron microscopy (TEM) a presence of both crystalline and amorphous phases was determined. Chemical composition and types of the bonds in the porous silicon layer was studied according to the data of infrared (IR) spectroscopy. The data on ultraviolet (UV) allowed to determine the energy of the possible direct transitions in nanostructures. Adsorption and desorption processes in nanostructures were studied.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.118</doi>
          <udk>538.9</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>mesoporous silicon</keyword>
            <keyword>nanopowders</keyword>
            <keyword>nanopowders</keyword>
            <keyword>spectroscopy</keyword>
            <keyword>cinnarizine</keyword>
            <keyword>systems of drug delivery</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.18/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>105-109</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-8319-1492</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Pozdniakov </surname>
              <initials>Stepan </initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0009-5076-6470</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Matveeva</surname>
              <initials>Elizaveta</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0009-0009-6600-0592</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Li</surname>
              <initials>Shixiong</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0001-9923-3995</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Sandzhieva</surname>
              <initials>Maria</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0000-0002-9257-6183</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Makarov</surname>
              <initials>Sergey</initials>
              <email>s.makarov@metalab.ifmo.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Enhanced optical performance of FAPbBr3-MOF composite films</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Metal halide perovskite nanocrystals have emerged as excellent candidate materials for various optoelectronic applications due to their distinguished optoelectronic properties. However, suffering from instability under environmental conditions such as humidity, temperature and ultraviolet radiation restricts its further development and larger-scale application. In this study, we present a one-step method for fabricating composite thin films of formamidinium lead bromide and a lead-based metal-organic framework with enhanced stability. Meanwhile, the obtained composite films exhibited a low amplified spontaneous emission threshold of 12.3 μJ·cm−2 enhancing their potential for efficient optoelectronic applications, including light-emitting devices and lasers.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.119</doi>
          <udk>538.975</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>perovskite</keyword>
            <keyword>metal-organic framework</keyword>
            <keyword>composites</keyword>
            <keyword>enhanced spontaneous emission</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.19/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>110-113</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0007-3942-7908</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kan </surname>
              <initials>Gennadiy </initials>
              <email>gennadiykang@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0009-4341-4346</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Cui</surname>
              <initials>Zhihao</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-1744-5976</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University, RAS</orgName>
              <surname>Terpitskiy</surname>
              <initials>Aleksey</initials>
              <email>terpiczkij@mail.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Scherbak</surname>
              <initials> Sergey </initials>
              <email>sergeygtn@yandex.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <orgName>Peter the Great St. Petersburg Polytechnic University </orgName>
              <surname>Zhurikhina</surname>
              <initials>Valentina</initials>
              <email>zhurikhina@mail.edu.ioffe.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Analysis of nonlinear susceptibility in ion-exchanged glass</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">We demonstrate that electric-field-assisted ion-exchange in glass allows one to obtain a structure with close to a step-like concentration and conductivity profiles. Application of DC voltage to the ion-exchanged glass results in charge accumulation. The electric field induces symmetry breaking and provides quadratic optical susceptibility in the glass. Nonlinear optical properties of modified glass are studied using the Maker fringe technique. Particularly, we study the influence of the nonlinear susceptibility tensor components ratio \(χ_{zxx} : χ_{zzz} \) on resulting characteristics. Comparing modeling and experiments, we deduced the ratio 1:3 which corresponds to Kleinman symmetry of isotropic materials.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.120</doi>
          <udk>535.016</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>glass</keyword>
            <keyword>ion-exchange</keyword>
            <keyword>second harmonic generation</keyword>
            <keyword>EFISH phenomenon</keyword>
            <keyword>phase-matching</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.20/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>114-118</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-7829-5326</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Adamovich </surname>
              <initials>Artem </initials>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Golovanov</surname>
              <initials>Victor</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0009-6999-9030</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Makhmud-Akhunov</surname>
              <initials>Marat</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0002-8612-6258</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Yavtushenko</surname>
              <initials>Igor</initials>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Soloviev</surname>
              <initials>Andrei</initials>
              <email>asus_work@mail.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Bodnarsky</surname>
              <initials>Dmitry</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Сapacitive properties of composite electrodes based on polyaniline and nanoporous titanium oxide obtained by plasma-electrolytic oxidation</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The capacitive characteristics of composite electrodes based on nanoporous titanium oxide obtained by plasma electrolytic oxidation are considered. It is shown that the specific capacitance of a multilayer supercapacitor based on formed titanium oxide and polyaniline (PANI) is 10 mF/cm2. The resulting oxide layers have a crystalline structure, providing minimal faradaic resistance, which is promising for use in electrochemical double-layer supercapacitors.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.121</doi>
          <udk>537.9</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>titanium</keyword>
            <keyword>electrolyte plasma</keyword>
            <keyword>nanoporous oxide</keyword>
            <keyword>polyaniline</keyword>
            <keyword>supercapacitor</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.21/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>119-124</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0001-7499-0578</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Institute of High Current Electronics, Siberian Branch of RAS</orgName>
              <surname>Kozhevnikov</surname>
              <initials>Vasily</initials>
              <email>Vasily.Y.Kozhevnikov@ieee.org</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Kozyrev</surname>
              <initials>Andrey</initials>
              <email>kozyrev@to.hcei.tsc.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">The phenomenon of “anomalous electrons” in pulsed high-current vacuum discharges</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">This paper presents the first comprehensive theoretical explanation, based on computational physical kinetics, for the phenomenon of electrons attaining energies exceeding the amplitude of the applied voltage (in eV units) in a vacuum diode. The proposed theory thoroughly elucidates the existence of so-called “anomalous electrons”, detailing their generation dynamics and underlying mechanisms. Additionally, the work calculates the integral energy spectra of these anomalous electrons in a high-current pulsed vacuum discharge and quantifies their contribution to the total current flow. The main tool used for numerical calculations is the latest meshless method for solving Vlasov-Poisson equation systems, known as the numerical flow iteration method (NuFI). The findings provide critical insights into non-equilibrium electron behaviour under extreme conditions, advancing the understanding of electron transport in vacuum-based high-power devices.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.122</doi>
          <udk>533.9.02</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>vacuum electronics</keyword>
            <keyword>anomalous electrons</keyword>
            <keyword>physical kinetics</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.22/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>125-128</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0005-4578-7550</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Masyutin </surname>
              <initials>Dmitriy </initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0004-6609-9741</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Rudnev</surname>
              <initials>Artem</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0003-3686-935X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>National Research University “Higher School of Economics” (St. Petersburg branch)</orgName>
              <surname>Moiseev</surname>
              <initials>Eduard</initials>
              <email>emoiseev@hse.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Vainilovich</surname>
              <initials>Alexey</initials>
              <email>a.vainilovich@ifanbel.bas-net.by</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Lutsenko</surname>
              <initials>Eugeniy</initials>
              <email>e.lutsenko@ifanbel.bas-net.by</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <orgName>Submicron Heterostructures for Microelectronics, Research &amp; Engineering Center, RAS</orgName>
              <surname>Tsatsulnikov</surname>
              <initials>Andrey</initials>
              <email>andrew@beam.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Sakharov</surname>
              <initials>Alexey</initials>
              <email>val@beam.ioffe.rssi.ru</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Arteev </surname>
              <initials>Dmitri </initials>
              <email>ArteevDS@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Nikolaev</surname>
              <initials>Andrei</initials>
              <email>Aen@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="010">
            <authorCodes>
              <orcid>0000-0002-2313-9051</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Pivovarova</surname>
              <initials>Antonina</initials>
            </individInfo>
          </author>
          <author num="011">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Zavarin</surname>
              <initials>Evgenii</initials>
              <email>EZavarin@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="012">
            <individInfo lang="ENG">
              <surname>Il'inskaya</surname>
              <initials>Natalya</initials>
              <email>Natalya.Ilynskaya@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="013">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Markov</surname>
              <initials>Lev</initials>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="014">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Smirnova</surname>
              <initials>Irina</initials>
              <email>irina@quantum.ioffe.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="015">
            <individInfo lang="ENG">
              <surname>Kryzhanovskaya Natalia V.</surname>
              <initials>Natalia</initials>
              <email>nkryzhanovskaya@hse.ru</email>
            </individInfo>
          </author>
          <author num="016">
            <authorCodes>
              <scopusid>35379962200</scopusid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Ioffe Physical Technical Institute of the Russian Academy of Sciences</orgName>
              <surname>Zhukov</surname>
              <initials>Alexey</initials>
              <email>zhukov@beam.ioffe.ru</email>
              <address>Russia, 194021, St.Petersburg, Polytechnicheskaya 26</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Investigation of microdisks lasers with an InGaN/GaN quantum well in the active region at elevated temperatures</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In this work, we present results on high-temperature operation microdisk lasers with an active region based on InGaN/GaN quantum wells. The diameter of the microdisks was 5 μm. The photoluminescence spectra measured in the temperature range from 25 °С to 100 °С. The temperature stability lasing is demonstrated.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.123</doi>
          <udk>535.372:621.315.592</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>GaN</keyword>
            <keyword>InGaN/GaN quantum wells</keyword>
            <keyword>microdisk resonator</keyword>
            <keyword>WGM</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.23/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>129-134</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-9733-751X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Shipenok </surname>
              <initials>Xenia</initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0007-6517-9784</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Mazhikenova</surname>
              <initials>Aliya</initials>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Glukhovskoy</surname>
              <initials>Evgeny</initials>
              <email>Glukhovskoy@gmail.com</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Shipovskaya </surname>
              <initials>Anna </initials>
              <email>Shipovskayaab@yandex.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Surface tension measurement of chitosan aspartate nanoparticle dispersions by a modified Wilhelmy method</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">A modification of the Wilhelmy method is proposed for measuring the surface tension of polymer nanoparticle dispersions, whose key feature is the static nature of the Wilhelmy plate when measuring the surface tension force. Tests on the example of nanostructured chitosan aspartate showed satisfactory accuracy of the modified method in estimating the surface activity of nanodispersions in a wide range of polymer concentrations. The concentration dependence of the surface tension of the dispersion of chitosan aspartate nanoparticles was obtained, and concentration ranges with different surface effects were outlined. The contribution of individual components used in obtaining nanoparticles to the surface activity of the nanodispersion was estimated.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.124</doi>
          <udk>547.458:[544+532.61]</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>chitosan</keyword>
            <keyword>L- and D-aspartic acid</keyword>
            <keyword>nanoparticles</keyword>
            <keyword>surface tension</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.24/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>135-138</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-6342-8448</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Vasin </surname>
              <initials>Sergei </initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0007-9634-0745</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kuzmin</surname>
              <initials>Nikolai</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0003-4854-2813</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Sergeev</surname>
              <initials>Viacheslav</initials>
              <email>sva@ulstu.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0001-6541-2637</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Buzaeva</surname>
              <initials>Mariya</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Study of thermal conductivity of polymer materials with carbon nanotubes using laser flash method</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The thermal conductivity of nanocomposite polymer materials based on polyvinyl alcohol and epoxy resin with the inclusion of multi-walled carbon nanotubes was studied using the laser flash method. The possibility of using the laser flash method to determine thermal conductivity in thin-film polymer materials is demonstrated and its features are revealed. It has been shown that the presence of carbon nanotubes in polymer matrices leads to an increase in the coefficients of thermal diffusivity and thermal conductivity by several times compared to pure polymer materials.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.125</doi>
          <udk>539.23</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>carbon nanotubes</keyword>
            <keyword>polymers</keyword>
            <keyword>thermal conductivity</keyword>
            <keyword>laser flash method</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.25/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>139-142</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Gridchin </surname>
              <initials>Vladislav</initials>
              <email>gridchinvo@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Mintairov</surname>
              <initials>Alexander</initials>
              <email>amintairov@mail.ioffe.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-4110-1647</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Shugabaev</surname>
              <initials>Talgat</initials>
              <email>talgashugabaev@mail.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Axenov</surname>
              <initials>Valerii</initials>
              <email>axenov.v@gmail.com</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Vlasov</surname>
              <initials>Alexei</initials>
              <email>vlasov@scell.ioffe.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Lendyashova </surname>
              <initials>Vera </initials>
              <email>erilerican@gmail.com</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Kotlyar</surname>
              <initials>Konstantin</initials>
              <email>konstantin21kt@gmail.com</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Eliseev</surname>
              <initials>Ilya</initials>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <orgName>St. Petersburg State University</orgName>
              <surname>Khrebtov</surname>
              <initials>Artem</initials>
              <email>khrebtovart@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="010">
            <individInfo lang="ENG">
              <surname>Reznik</surname>
              <initials>Rodion </initials>
              <email>moment92@mail.ru</email>
            </individInfo>
          </author>
          <author num="011">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Davydov</surname>
              <initials>Valery</initials>
              <email>Valery.Davydov@mail.ioffe.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="012">
            <individInfo lang="ENG">
              <surname>Cirlin</surname>
              <initials>George </initials>
              <email>george.cirlin@mail.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Growth of GaN nanowires with InN inserts by PA-MBE</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">For the first time, the growth details and photoluminescence properties of ultra-thin InN insertions embedded in GaN nanowires are presented. The InN insertions embedded in GaN nanowires exhibit photoluminescence in the range of 2.9–3.35 eV, where the most intense emission line at 3.17–3.23 eV is tentatively attributed to monolayer-thick InN insert based on comparative spectral analysis. These findings can be promising for the development of single-photon sources and Wigner quantum dots operating from cryogenic to elevated temperatures.</abstract>
        </abstracts>
        <codes>
          <doi>/10.18721/JPM.183.126</doi>
          <udk>538.975</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>InN</keyword>
            <keyword>GaN</keyword>
            <keyword>MBE</keyword>
            <keyword>quantum dots</keyword>
            <keyword>nanowires</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.26/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>143-147</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Arteev </surname>
              <initials>Dmitri </initials>
              <email>ArteevDS@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Sakharov</surname>
              <initials>Alexey</initials>
              <email>val@beam.ioffe.rssi.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Nikolaev</surname>
              <initials>Andrei</initials>
              <email>Aen@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Zavarin</surname>
              <initials>Evgenii</initials>
              <email>EZavarin@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0000-0002-2793-5717</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Peter the Great St. Petersburg Polytechnic University</orgName>
              <surname>Filimonov</surname>
              <initials>Alexey</initials>
              <email>filimonov@rphf.spbstu.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <orgName>Submicron Heterostructures for Microelectronics, Research &amp; Engineering Center, RAS</orgName>
              <surname>Tsatsulnikov</surname>
              <initials>Andrey</initials>
              <email>andrew@beam.ioffe.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Optical reflectance spectroscopy for barrier thickness measurement of AlGaN/GaN heterostructures: comparison with X-ray reflectometry</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">This study evaluates optical reflectance (OR) spectroscopy as a rapid, cost-effective alternative to X-ray reflectometry (XRR) for measuring the thickness of the AlGaN barrier layer in AlGaN/GaN heterostructures. OR spectroscopy demonstrated excellent agreement with XRR, with deviations not exceeding 1 nm. The results highlight OR spectroscopy as an efficient and reliable method for routine characterization of GaN-based heterostructures.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.127</doi>
          <udk>621.315.592</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>gallium nitride</keyword>
            <keyword>AlGaN/GaN</keyword>
            <keyword>heterostructure</keyword>
            <keyword>optical reflectance spectroscopy</keyword>
            <keyword>X-ray reflectance</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.27/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>148-151</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Andreeva  </surname>
              <initials>Anna</initials>
              <email>aa5991696@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Ilkiv</surname>
              <initials>Igor </initials>
              <email>fiskerr@ymail.com</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Kotlyar</surname>
              <initials>Konstantin</initials>
              <email>konstantin21kt@gmail.com</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>St. Petersburg State University</orgName>
              <surname>Khrebtov</surname>
              <initials>Artem</initials>
              <email>khrebtovart@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Gridchin </surname>
              <initials>Vladislav</initials>
              <email>gridchinvo@gmail.com</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Cirlin</surname>
              <initials>George </initials>
              <email>george.cirlin@mail.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Reznik</surname>
              <initials>Rodion </initials>
              <email>moment92@mail.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">MBE growth of wurtzite AlGaAs nanowires with zinc-blende insertions</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In this work we present the experimental results on the molecular-beam epitaxy growth of wurtzite AlGaAs nanowires with nanoscale zinc-blende insertions on silicon substrate. Structural characterization confirmed the formation of zinc-blende nanoscale segments within the wurtzite nanowire matrix. Autocorrelation function measurements for emission at&#13;
710 nm have shown the characteristic dip at zero time delay, which indicates that the synthesized nanostructures are sources of single photons.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.128</doi>
          <udk>538.9</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>nanowires</keyword>
            <keyword>AlGaAs</keyword>
            <keyword>quantum dots</keyword>
            <keyword>wurtzite</keyword>
            <keyword>molecular-beam epitaxy</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.28/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>152-155</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Lendyashova </surname>
              <initials>Vera </initials>
              <email>erilerican@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Kotlyar</surname>
              <initials>Konstantin</initials>
              <email>konstantin21kt@gmail.com</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>St. Petersburg State University</orgName>
              <surname>Khrebtov</surname>
              <initials>Artem</initials>
              <email>khrebtovart@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Cirlin</surname>
              <initials>George </initials>
              <email>george.cirlin@mail.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Ilkiv</surname>
              <initials>Igor </initials>
              <email>fiskerr@ymail.com</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Effect of GaAs buffer layer on the characteristics of GaAs nanowires grown by molecular beam epitaxy on Si(111) substrates</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The possibility of depositing colloidal nanoparticles onto an amorphous GaAs layer grown on Si(111) substrates and the direct molecular beam epitaxy of size-uniform GaAs nanowires with diameters below 20 nm were demonstrated. Examination of the nanowires revealed a nearly pure wurtzite crystal structure with low stacking fault density.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.129</doi>
          <udk>538.975</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>nanowire</keyword>
            <keyword>molecular beam epitaxy</keyword>
            <keyword>semiconductors</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.29/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>156-160</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0006-2524-7618</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Boitsova </surname>
              <initials>Natalia </initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0003-3859-6981</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Abelit</surname>
              <initials>Anna</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-3756-0701</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Verlov</surname>
              <initials>Nikolai</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0002-5470-9301</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Stupin</surname>
              <initials>Daniil</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Noises in bioelectronic devices: a case study of electromagnetic interference in biolaboratory facilities</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Since bioelectrical signals typically have amplitudes below μA and lower than mV, their measurement is significantly susceptible to environmental electromagnetic interference (EMI). In this study, we measured and analyzed the levels of electromagnetic interference in biolaboratory rooms – the birthplace and preliminary test center for any bioelectronic device. We have shown that in an ordinary biolaboratory, which is equipped with typical modern instruments, like digital microscopes, EMI in the sub-250 kHz range can include both periodic and wide-band signals, which can influence the working of impedance sensors and neuroprosthetic implants. The results of our study can be used for the development and testing of noise-suppression systems for bioelectronics applications.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.130</doi>
          <udk>534.852.6</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>electromagnetic interference</keyword>
            <keyword>noise</keyword>
            <keyword>impedance devices</keyword>
            <keyword>spectra analysis</keyword>
            <keyword>neuroprosthetic care</keyword>
            <keyword>multielectrode arrays</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.30/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>161-164</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <orgName>Southern Federal University</orgName>
              <surname>Klimin</surname>
              <initials>Viktor</initials>
              <email>kliminvs@sfedu.ru</email>
              <address>Rostov-on-Don, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-9326-2349</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Demyanenko</surname>
              <initials>Alexander</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-6923-7917</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Bobkov</surname>
              <initials>Ivan</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Metamaterials formed on the surface of silicon carbide by plasma treatment</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In the presented work, a unit cell of a self-complementary metamaterial was designed, which is alternating patches and holes in a conductive graphene-like layer 7 μm thick on a silicon carbide substrate 250 μm thick. The results of a numerical study of the developed structure are presented. The calculations considered the conductivity of the graphene-like film, as well as the dielectric parameters of the silicon carbide substrate. The developed metamaterial is designed to convert circular polarization into linear; the central operating frequency of the resulting structure is 10 GHz. The dimensions of the unit cell are 2.8 mm × 5.6 mm. The elements obtained can be used in microwave technology and antenna structures. For the manufacture of structures, it is planned to use the method of plasma-chemical etching of silicon carbide in a fluorine-containing gas environment, which destroys the silicon component and leaves a graphene-like conductive layer on the surface. The thickness of the graphene-like layer depends on the power of the inductively coupled plasma source and the processing time; in this work, a thickness of 7 µm was taken, obtained at 800 W and 8.5 minutes of etching SiC in an SF6/Ar atmosphere.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.131</doi>
          <udk>621.35.035</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>plasma etching</keyword>
            <keyword>metamaterials</keyword>
            <keyword>graphene-like film</keyword>
            <keyword>silicon carbide</keyword>
            <keyword>microelectronics</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.31/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>165-168</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <orgName>Southern Federal University</orgName>
              <surname>Klimin</surname>
              <initials>Viktor</initials>
              <email>kliminvs@sfedu.ru</email>
              <address>Rostov-on-Don, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-8635-2573</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Gusev</surname>
              <initials>Evgeny</initials>
              <email>eyugusev@sfedu.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-9329-0662</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Polyakov</surname>
              <initials>Vadim</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0009-0000-7843-9839</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Tarasov</surname>
              <initials>Pavel</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0001-1684-1475</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Grigoryev</surname>
              <initials>Mikhail</initials>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Wang</surname>
              <initials>Shumeng</initials>
              <email>smwang@sdlaser.cn</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Wang</surname>
              <initials>Zhaowei</initials>
              <email>zw.wang@qlu.edu.cn</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Jiang</surname>
              <initials>Liyuan</initials>
              <email>jiangliyuan@sdlaser.cn</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <surname>Zhang</surname>
              <initials>Wei</initials>
              <email>zhang.wei@qlu.edu.cn</email>
            </individInfo>
          </author>
          <author num="010">
            <individInfo lang="ENG">
              <orgName>Southern Federal University</orgName>
              <surname>Ageev</surname>
              <initials>Oleg</initials>
              <email>ageev@sfedu.ru</email>
              <address>Taganrog, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">All-silicon elements of terahertz photonics obtained by plasma etching</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In the presented study, nanostructures on a silicon substrate were experimentally formed using the plasma-chemical etching method in a combined discharge plasma. The main objective was to analyze the relationship between the plasma-chemical etching process parameters and the structure geometry, namely: the deviation angle from the vertical, the height of the elements, and deviations from the nominal dimensions. Particular attention was paid to the influence of the active gas concentration, the power of the inductively coupled plasma source (ICP), and the power of the capacitively coupled source (CCP, bias voltage) on the structure geometry. The resulting nanostructures are considered as potential elements of terahertz photonics of metasurfaces. For example, process settings with an ICP power of 400 W, an active gas volume fraction of 7%, and a bias voltage of 101 V made it possible to obtain structures with a height of 136 nm, deviating from the specified dimensions by only 2% (98% compliance).</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.132</doi>
          <udk>66.087.3</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>all-silicon elements</keyword>
            <keyword>terahertz photonics</keyword>
            <keyword>metamaterials</keyword>
            <keyword>plasma etching</keyword>
            <keyword>microelectronics</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.32/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>169-172</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <orgName>Southern Federal University</orgName>
              <surname>Klimin</surname>
              <initials>Viktor</initials>
              <email>kliminvs@sfedu.ru</email>
              <address>Rostov-on-Don, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0000-7843-9839</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Tarasov</surname>
              <initials>Pavel</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0009-0001-1684-1475</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Grigoryev</surname>
              <initials>Mikhail</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0009-0007-7197-9104</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Gavrish</surname>
              <initials>Polina</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0007-2496-9317</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Tkacheva</surname>
              <initials>Anastasia</initials>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0009-0005-7668-4079</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Ptashnik</surname>
              <initials>Vitaly</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Formation of a graphene-like conductive film on the surface of SiC by laser destruction of silicon</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">This study is devoted to the formation of conductive graphene-like layers on the surface of silicon carbide by laser removal of silicon in local zones. The work demonstrates the effect of the laser system pulse frequency on the thickness and electrical conductivity of the resulting conductive graphene-like layer on a silicon carbide plate. In addition, optimal parameters for obtaining a conductive coating and the required surface roughness suitable for designing antenna devices are determined. At a frequency of 100 kHz, conductive graphene films of the coating with a thickness of 6.5 μm were obtained, while the modified zone was 93% of the total impact area. The thickness of the conductive layer in the local zone processed at a frequency of 40 kHz reached 5 μm, and at a frequency of 120 kHz − 7 μm. The results demonstrate the potential for the development and creation of sensor elements, optoelectronics and photonics devices.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.133</doi>
          <udk>621.315.</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>graphene</keyword>
            <keyword>laser destruction</keyword>
            <keyword>silicon carbide</keyword>
            <keyword>microelectronics</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.33/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>173-177</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-7746-3009</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Rybalka</surname>
              <initials>Sergey</initials>
              <email>sbrybalka@yandex.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0001-4724-3734</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Brundasov </surname>
              <initials>Daniil </initials>
              <email>kineticx@bk.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-7294-7549</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kulchenkov</surname>
              <initials>Evgeny</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0002-8639-3575</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Demidov</surname>
              <initials>Andrey</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">The operational amplifiers radiation hardness experimental study</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The radiation hardness of the operational amplifiers IS-OU2 and LM358 has been performed experimentally using X-ray research complex. It was found that the measured characteristics of operational amplifiers (input offset voltage, consumption current, voltage gain) for the IS-OU2 and its analogue LM358 are similar and demonstrate radiation hardness. As a result, the designed and produced IS-OU2 operational amplifier can be used for producing of spacecraft equipment electronics that can operate under space radiation conditions.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.134</doi>
          <udk>537.312.54; 621.375.4</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>operational amplifiers</keyword>
            <keyword>X-ray irradiation</keyword>
            <keyword>ionizing dose effects</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.34/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>178-181</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0005-3723-5924</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Federal State Budgetary Institution of Science K.A. Valiev Institute of Physics and Technology of the RAS Yaroslavl Branch</orgName>
              <surname>Morozov </surname>
              <initials>Matvey </initials>
              <email>matvey11212@gmail.com</email>
              <address>Yaroslavl, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Uvarov </surname>
              <initials>Ilia </initials>
              <email>i.v.uvarov@bk.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">MEMS switch with an intermediate electrode for high-speed communication networks</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">MEMS switches are considered as a promising element base of microwave electronics, but their performance has not reached the required level yet. The ratio of capacitances in the closed and open states does not exceed 10 and has to be increased. A possible method is to apply an intermediate electrode over the dielectric coating of a transmission line. In this&#13;
work, a MEMS switch with an intermediate electrode is proposed for use in 5G communication networks.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.135</doi>
          <udk>621.3</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>MEMS switch</keyword>
            <keyword>intermediate electrode</keyword>
            <keyword>capacitance ratio</keyword>
            <keyword>isolation</keyword>
            <keyword>insertion loss</keyword>
            <keyword>finite element method</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.35/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>182-186</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0001-6869-1213</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Vyacheslavova</surname>
              <initials>Ekaterina</initials>
              <email>cate.viacheslavova@yandex.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Mokhov</surname>
              <initials>Dmitry</initials>
              <email>mokhov@spbau.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-0061-6687</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Uvarov</surname>
              <initials>Alexander</initials>
              <email>lumenlight@mail.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0002-3503-7458</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>St. Petersburg Electrotechnical University "LETI"</orgName>
              <surname>Maksimova</surname>
              <initials>Alina A.</initials>
              <email>deer.blackgreen@yandex.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0005-6836-4091</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Mikhaylov </surname>
              <initials>Oleg </initials>
              <email>oleg.mikhaylov.00@gmail.com</email>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0002-4894-6503</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Baranov</surname>
              <initials>Artem I.</initials>
              <email>baranov_art@spbau.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <orcid>0000-0002-7632-3194</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Gudovskikh</surname>
              <initials>Alexander</initials>
              <email>gudovskikh@spbau.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Black silicon formation using cryogenic etching and photoresist layer</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">A series of experiments were conducted to develop the plasma etching of black silicon through a layer of polydimethylglutarimide (PMGI) photoresist. The silicon wafers were previously subjected to wet-chemical treatment. A ~25 nm thick photoresist layer facilitates the process of creating regular black silicon structures on substrates with a diameter of 100 mm. The etching process was varied in terms of the sulfur hexafluoride (SF6) and oxygen (O2) gas mixture ratio, RF power applied to the substrate holder (bias power), inductively coupled plasma (ICP) power and chamber pressure. Increasing the bias power from 10 to 30 W under otherwise constant conditions enhances the etching rate. Reducing the pressure in the reactor from 10 to 5 mTorr at a constant gas flow rate leading to a higher etching rate. Increasing the proportion of oxygen in the SF6/O2 gas mixture (2:1) enhances passivation, reducing the black silicon structures size.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.136</doi>
          <udk>621.383.51</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>black silicon</keyword>
            <keyword>PMGI photoresist</keyword>
            <keyword>cryogenic etching</keyword>
            <keyword>solar cell</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.36/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>187-190</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Shepeleva</surname>
              <initials>Anastasia</initials>
              <email>eduard.shepelev.67@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-9602-7221</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Research Institute of Electronic and Mechanical Devices</orgName>
              <surname>Gurin</surname>
              <initials>Sergey</initials>
              <address>Penza, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0001-9319-2475</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Research Institute of Electronic and Mechanical Devices</orgName>
              <surname>Novichkov </surname>
              <initials>Maksim </initials>
              <address>Penza, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0009-0009-4548-3724</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Agafonov </surname>
              <initials>Dmitriy </initials>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Pecherskaya</surname>
              <initials>Ekaterina</initials>
              <email>pea1@list.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0009-0005-5656-4918</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Research Institute of Electronic and Mechanical Devices</orgName>
              <surname>Zuev</surname>
              <initials>Vyacheslav</initials>
              <address>Penza, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Technological process of manufacturing a gas-sensitive multisensor chip based on a passivating coating of zinc oxide nanorods obtained by thin-film technology</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">A method for manufacturing a gas-analytical multisensor chip is presented. The technological process of manufacturing with an additional SiO2 layer is described. It was found&#13;
that the design of the experimental sample of the multisensor chip and the technology of synthesis of low-dimensional gas-sensitive layers provide sensitivity to detected gases up to 1 ppm and allow to increase the speed and temporal stability.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.137</doi>
          <udk>621.794.47</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>gas-sensitive layer</keyword>
            <keyword>dopant</keyword>
            <keyword>response time</keyword>
            <keyword>recovery time</keyword>
            <keyword>technological process</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.37/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>191-194</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0000-3147-6974</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University of RAS</orgName>
              <surname>Funtikova</surname>
              <initials>Anastasiia</initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0002-8661-4083</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Mozharov</surname>
              <initials>Alexey</initials>
              <email>mozharov@spbau.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Sharov</surname>
              <initials>Vladislav</initials>
              <email>vl_sharov@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0001-8440-494X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Novikova</surname>
              <initials>Kristina</initials>
              <email>novikova_k@spbau.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0000-0002-4172-940X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Dvoretckaia </surname>
              <initials>Liliya</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Investigation of second harmonic generation in spherical mesoporous Si/SiO2 nanoparticles on gold</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In this work, experimental and numerical investigation of second harmonic generation (SHG) in mesoporous Si/SiO2 nanoparticles has been performed. Experimental results are well-described by simulations. Spectral analysis reveals that SHG efficiency maxima correlate with Mie resonances of Si/SiO2 nanoparticles. Tuning the diameter of the structures the maximum SHG efficiency for required wavelength can be achieved. The nonlinear optical susceptibility of the studied nanoparticles attains values on the order of 1.59×10−14 m2/V, which exceeds that of bulk silicon. Spherical mesoporous Si/SiO2 nanoparticles demonstrate effective second harmonic generation with simple, low-cost fabrication, making them promising candidates as tunable frequency converters for integrated nanophotonic circuits.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.138</doi>
          <udk>535.015</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>second harmonic generation</keyword>
            <keyword>silicon</keyword>
            <keyword>spherical nanoparticles</keyword>
            <keyword>Mie resonances</keyword>
            <keyword>gold</keyword>
            <keyword>mesoporous</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.38/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>195-198</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0001-8930-5438</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Lavrinenko </surname>
              <initials>Valeriy </initials>
              <email>Lavrinenko_valerav@inbox.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Vasilieva</surname>
              <initials>Anastasia</initials>
              <email>anastasiastru@mail.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Parfenov</surname>
              <initials>Vadim</initials>
              <email>vadim_parfenov@mail.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Laser polishing of steel surface for microfluidic applications</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The paper examines various modes of laser polishing of stainless steel surface to decrease a surface roughness for creating model micro-grooves corresponding to the elements of the microfluidic topology. The effect of the formation of an oxide film and its effect on the roughness of the treated area is considered as well. The data obtained is confirmed by measurements using a profilometer.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.139</doi>
          <udk>53.06</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>microfluidics</keyword>
            <keyword>laser processing</keyword>
            <keyword>laser polishing</keyword>
            <keyword>steel</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.39/</furl>
          <file></file>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>199-203</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-6222-5526</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Skolkovo Institute of Science and Technology</orgName>
              <surname>Verkhogliadov</surname>
              <initials>Grigorii</initials>
              <email>g.verkhogliadov@skoltech.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0002-0616-2524</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Marunchenko</surname>
              <initials>Alexandr</initials>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>ITMO University</orgName>
              <surname>Sapozhnikova</surname>
              <initials>Elizaveta</initials>
              <email>e.sapozhnikova@metalab.ifmo.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0003-2283-3495</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kushchenko</surname>
              <initials>Olga</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0000-0003-2423-7945</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>ITMO University</orgName>
              <surname>Sinelnik</surname>
              <initials>Artem</initials>
              <email>sinelnik@metalab.ifmo.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0002-1793-6812</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Skolkovo Institute of Science and Technology</orgName>
              <surname>Pushkarev</surname>
              <initials>Anatoly</initials>
              <email>anatoly.pushkarev@metalab.ifmo.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Perovskite-GST hybrid platform fo