<?xml version="1.0" encoding="utf-8"?>
<journal>
  <titleid/>
  <issn>2304-9782, 2618-8686, 2405-7223</issn>
  <journalInfo lang="ENG">
    <title>St. Petersburg Polytechnic University Journal: Physics and Mathematics</title>
  </journalInfo>
  <issue>
    <volume>18</volume>
    <number>3.1</number>
    <altNumber> </altNumber>
    <dateUni>2025</dateUni>
    <pages>1-319</pages>
    <articles>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>12-18</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Romashkin</surname>
              <initials>Alexey</initials>
              <email>romaleval@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-5063-1669</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Rozanov</surname>
              <initials>Roman</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-4024-5411</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Vishnevskiy</surname>
              <initials>Alexey</initials>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Mitrofanova </surname>
              <initials>Anastasia</initials>
              <email>mitrofanova.ae@phystech.edu</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Stebelkov</surname>
              <initials>Artem</initials>
              <email>stebelkov@zntc.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Nepomilueva</surname>
              <initials>Valeriya</initials>
              <email>valeria.nepomilueva@yandex.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Levin</surname>
              <initials>Denis</initials>
              <email>vkn@miee.ru</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Svetikov</surname>
              <initials>Vladimir</initials>
              <email>vl.svetikov@gmail.com</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <orgName>National Research University of Electronic Technology</orgName>
              <surname>Nevolin</surname>
              <initials>Vladimir</initials>
              <email>vkn@miee.ru</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Comparison of the refractive index changes of nanolayers of amidated and carboxylated carbon nanotubes after adsorption of water and ammonia molecules</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Spray-deposited layers of amidated carbon nanotubes (ACNTs) were characterized using AFM, Raman scattering, and spectroscopic ellipsometry. The layer thickness, diameters, and band gap of ACNTs, as well as the changes in the refractive index (n) at 1319 nm and 1625 nm after H2O and NH3 adsorption in air and H2O in N2 were analyzed in comparison with carboxylated CNTs. Modeling the resonance peak shift due to changes in n for the ACNT-coated Si waveguide microring resonator after NH3 adsorption allows us to propose the use of such a CNT layer set for integrated optical sensors for gas recognition tasks.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.101</doi>
          <udk>[621.793:621.315.5+544.164]::535.93::681.586</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>carbon nanotube</keyword>
            <keyword>ellipsometry</keyword>
            <keyword>integrated optics</keyword>
            <keyword>microring resonator</keyword>
            <keyword>sensor</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.1/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>19-22</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Shandyba </surname>
              <initials>Nikita </initials>
              <email>shandyba.nikita@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Eremenko</surname>
              <initials>Mikhail</initials>
              <email>eryomenko@sfedu.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-6762-2053</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Southern Federal University</orgName>
              <surname>Dukhan </surname>
              <initials>Denis </initials>
              <email>duhan@sfedu.ru </email>
              <address>Taganrog, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Chernenko </surname>
              <initials>Natalia</initials>
              <email>nchernenko@sfedu.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Kirichenko </surname>
              <initials>Danil </initials>
              <email>dankir@sfedu.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0009-0001-5183-5396</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kugaevsky</surname>
              <initials>Alexander</initials>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <orgName>National Research University ‘Higher School of Economics”</orgName>
              <surname>Makhov</surname>
              <initials>Ivan</initials>
              <email>imahov@hse.ru</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Kryzhanovskaya Natalia V.</surname>
              <initials>Natalia</initials>
              <email>nkryzhanovskaya@hse.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <surname>Balakirev</surname>
              <initials>Sergey</initials>
              <email>sbalakirev@sfedu.ru</email>
            </individInfo>
          </author>
          <author num="010">
            <individInfo lang="ENG">
              <surname>Solodovnik</surname>
              <initials>Maxim</initials>
              <email>solodovnikms@sfedu.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Ordered GaAs NW growth on Si(111) substrates modified by two-step FIB treatment</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">This work demonstrates, for the first time, the selective formation of ordered arrays of vertical GaAs nanowires on Si(111) with a native oxide layer using a two-step pre-treatment of the substrate surface with a focused Ga-ion beam. Based on our previous studies, we show that modifying the substrate through a two-step protocol — first applying a continuous surface treatment with low doses (up to 1×10–13 C/µm2), followed by spot treatment with medium doses (from 1×10–13 to 1×10–12 C/µm2) — effectively suppresses parasitic growth and enables nanowire formation at defined surface locations. Furthermore, adjusting the spacing between ion implantation points (from 0.5 to 5 um) allows precise control over the pitch of the nanowire array. By optimizing dose values, we achieve the formation of single, free-standing, vertically oriented nanowires at each ion beam impact site. The study of optical properties of nanowire arrays reveals their high structural quality, as evidenced by intense photoluminescence of GaAs up to room temperatures.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.102</doi>
          <udk>538.975</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>silicon</keyword>
            <keyword>focused ion beam</keyword>
            <keyword>molecular beam epitaxy</keyword>
            <keyword>nanowires</keyword>
            <keyword>III-V</keyword>
            <keyword>nanopatterning</keyword>
            <keyword>site-controlled</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.2/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>23-29</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Babenko</surname>
              <initials>Sofiya</initials>
              <email>sofi.bb@yandex.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Bryleva</surname>
              <initials>Anna</initials>
              <email>anniebryleva@yandex.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Kanaev</surname>
              <initials>Kirill</initials>
              <email>kir-kv2005@mail.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Kudryavtsev</surname>
              <initials>Oleg</initials>
              <email>oleg6565657@gmail.com</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Nigmatullina</surname>
              <initials>Razalina</initials>
              <email>razalina.n2004@gmail.com</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Rayanova</surname>
              <initials>Kamilla</initials>
              <email>raanovakamilla@gmail.com</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Sudakova</surname>
              <initials>Alexandra</initials>
              <email>asudakova12@gmail.com</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Trukhanova</surname>
              <initials>Mariya</initials>
              <email>trukhanova@physics.msu.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <surname>Komarov </surname>
              <initials>Ivan</initials>
              <email>master_kom@mail.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Thin reduced graphene oxide based films for nanoelectronics and sensors</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Formation of new devices of flexible and organic electronics requires new materials. One of the perspective classes of materials is graphene derivatives. To enhance wettability of polymer substrates we used multicomponent graphene oxide suspension with further reduction of obtained films with laser irradiation. We used UV and IR lasers for local reduction of these films to form transistors and biosensors. Graphene oxide film from 0.93 mg/ml suspension with lacquer thinner was successfully deposited and reduced for BGTE transistor formation. Reduced graphene oxide film acted as an n-type semiconductor with 2–8×10−3 cm2/V·s−1 mobility.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.103</doi>
          <udk>620.3</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>contact angle</keyword>
            <keyword>dispersion medium</keyword>
            <keyword>graphene oxide</keyword>
            <keyword>reduced graphene oxide</keyword>
            <keyword>thin films</keyword>
            <keyword>transistor</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.3/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>30-35</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0008-4344-4863</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Nikolaeva </surname>
              <initials>Aleksandra </initials>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Anikina </surname>
              <initials>Maria</initials>
              <email>mari.a.nikina@yandex.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-3469-5897</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Kondratev</surname>
              <initials>Valeriy</initials>
              <email>kvm_96@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Sharov</surname>
              <initials>Vladislav</initials>
              <email>vl_sharov@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <orgName>Moscow Institute of Physics and Technology (MIPT)</orgName>
              <surname>Barulina</surname>
              <initials>Elena</initials>
              <email>e.barulina@rqc.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Gridchin </surname>
              <initials>Vladislav</initials>
              <email>gridchinvo@gmail.com</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <orgName>St. Petersburg State University</orgName>
              <surname>Khrebtov</surname>
              <initials>Artem</initials>
              <email>khrebtovart@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="008">
            <authorCodes>
              <orcid>0000-0002-5376-5555</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kuchmizhak </surname>
              <initials>Aleksandr</initials>
            </individInfo>
          </author>
          <author num="009">
            <authorCodes>
              <orcid>0000-0001-7223-7232</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Moscow Institute of Physics and Technology (National Research University)</orgName>
              <surname>Bolshakov</surname>
              <initials>Alexey</initials>
              <email>acr1235@mail.ru</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Hybrid emitters based on two-dimensional WSe2 and ordered plasmonic nanobumps</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Two-dimensional transition metal dichalcogenides (TMDs), particularly tungsten diselenide (WSe2), exhibit exceptional optoelectronic properties, including strong light-matter interactions and tunable exciton behavior, making them promising for nanophotonic applications. This work investigates a hybrid system comprising a WSe2 monolayer integrated with a plasmonic metasurface of Au-nanobumps to enhance photoluminescence (PL) through exciton-plasmon coupling and strain-induced bandgap modulation. The WSe2 monolayers were&#13;
mechanically exfoliated and transferred onto a laser-patterned Au-nanobump array fabricated via femtosecond laser printing, offering a scalable alternative to conventional lithography. Optical characterization showed a threefold enhancement of photoluminescence intensity of WSe2 monolayer lying on a nanobump compared to WSe2 on a flat gold substrate, what attributed to localized plasmon-exciton interactions and strain effects. The study demonstrates a cost-effective, lithography-free approach for tailoring hybrid TMD-plasmonic systems, enabling precise control over optical properties for next-generation optoelectronic devices.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.104</doi>
          <udk>535.372</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>WSe2</keyword>
            <keyword>emitter</keyword>
            <keyword>nanobump</keyword>
            <keyword>photoluminescence</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.4/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>36-39</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Subbotin</surname>
              <initials>Evgenii </initials>
              <email>jons712@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Kozlov</surname>
              <initials>Aleksei</initials>
              <email>kozlov.ag@dvfu.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0001-8726-5615</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Pavlov</surname>
              <initials>Dmitrii </initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0009-0007-5206-5753</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Lisenkov</surname>
              <initials>Oleg</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0000-4799-002X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Udilov</surname>
              <initials>Andrei</initials>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Goroshko</surname>
              <initials>Dmitrii </initials>
              <email>goroshko@iacp.dvo.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <orgName>Institute of Nanotechnologies of Microelectronics of the RAS</orgName>
              <surname>Poliakov</surname>
              <initials>Maxim</initials>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Volkova </surname>
              <initials>Lidiya </initials>
              <email>lidiya.volkova.96@mail.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <authorCodes>
              <orcid>0009-0008-0181-8994</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Prokopeva</surname>
              <initials>Glikeriya</initials>
            </individInfo>
          </author>
          <author num="010">
            <authorCodes>
              <orcid>0000-0002-8726-9832</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Institute of Automation and Control Processes, Far Eastern Branch of the RAS</orgName>
              <surname>Chernev</surname>
              <initials>Igor</initials>
              <email>igor_chernev7@mail.ru</email>
            </individInfo>
          </author>
          <author num="011">
            <authorCodes>
              <orcid>0009-0007-4827-2653</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Khoroshilov</surname>
              <initials>Dmitry</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Synthesis of Mg2Si-based core-shell nanowires</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In this work, we proposed the method for synthesis of nanowires with Mg2Si/Sibased core-shell heterostructure. Silicon nanowires acting as a source of silicon for the silicification reaction were obtained by well-studied metal-stimulated chemical etching of silicon with orientation (100) doped with boron, with a resistivity of 1–10 Ω×cm. A 30 nm thick gold film&#13;
with an adhesive titanium sublayer 1.5 nm thick was used as the catalytic metal. The etched nanowires had a height of ~10 microns and a diameter of 1.5 microns. The Mg2Si shell was&#13;
formed using the solid-phase epitaxy method under ultrahigh vacuum conditions. The thickness of the silicide shell was 400–600 nm on the side surfaces of the nanowires.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.105</doi>
          <udk>538.9</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>silicon</keyword>
            <keyword>magnesium silicide</keyword>
            <keyword>epitaxy</keyword>
            <keyword>nanowires</keyword>
            <keyword>core-shell</keyword>
            <keyword>thermoelectricity</keyword>
            <keyword>MACE</keyword>
            <keyword>SEM</keyword>
            <keyword>EDX</keyword>
            <keyword>TEM</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.5/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>40-43</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Subbotin</surname>
              <initials>Evgenii </initials>
              <email>jons712@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0000-4799-002X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Udilov</surname>
              <initials>Andrei</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0009-0008-0181-8994</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Prokopeva</surname>
              <initials>Glikeriya</initials>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Goroshko</surname>
              <initials>Dmitrii </initials>
              <email>goroshko@iacp.dvo.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Kozlov</surname>
              <initials>Aleksei</initials>
              <email>kozlov.ag@dvfu.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0002-8726-9832</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Institute of Automation and Control Processes, Far Eastern Branch of the RAS</orgName>
              <surname>Chernev</surname>
              <initials>Igor</initials>
              <email>igor_chernev7@mail.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <orcid>0009-0007-5206-5753</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Lisenkov</surname>
              <initials>Oleg</initials>
            </individInfo>
          </author>
          <author num="008">
            <authorCodes>
              <orcid>0009-0007-4827-2653</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Khoroshilov</surname>
              <initials>Dmitry</initials>
            </individInfo>
          </author>
          <author num="009">
            <authorCodes>
              <orcid>0009-0002-7285-3224</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Sinotova</surname>
              <initials>Sofia</initials>
            </individInfo>
          </author>
          <author num="010">
            <authorCodes>
              <orcid>0000-0003-4127-2988</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Institute of Automation and Control Processes, Far Eastern Branch of the RAS</orgName>
              <surname>Galkin</surname>
              <initials>Nikolay</initials>
              <email>galkin@iacp.dvo.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Influence of the growth regime on the transport properties of doped Mg2Si films</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In this work, we studied transport properties of the doped Mg2Si film on silicon substrate. The ~1 µm-thickness film was synthesized by the solid phase epitaxy method. Well-proven Ag was chosen as a dopant. At room temperature, the resistivity was 2 Ω×cm, the mobility was 327 cm2/(V×s), the density was 9.3×1015 cm−3. We established that using the solid phase epitaxy with the low temperature annealing regime led to mixed electron conductivity of the doped Mg2Si:Ag film due to the substitution of Si-site by Ag. The activation energy of the donor level is 24 meV.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.106</doi>
          <udk>538.9</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>silicon</keyword>
            <keyword>magnesium silicide</keyword>
            <keyword>solid phase epitaxy</keyword>
            <keyword>silver</keyword>
            <keyword>Hall-measurements</keyword>
            <keyword>SEM</keyword>
            <keyword>EDX</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.6/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>44-47</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-1744-5976</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Terpitskiy </surname>
              <initials>Aleksey </initials>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Reshetov</surname>
              <initials>Ilya</initials>
              <email>reshetov_iv@spbstu.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Scherbak</surname>
              <initials> Sergey </initials>
              <email>sergeygtn@yandex.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>Alferov University </orgName>
              <surname>Lipovskii</surname>
              <initials>Andrey</initials>
              <email>lipovskii@mail.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Visualization of electric field of e-beam-formed charge patterns in glass</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">We have formed a given pattern of the second order optical nonlinearity in the&#13;
subsurface region of a glass by electron irradiation. The nonlinearity was induced by the electric&#13;
field of the electrons captured by the glass. Formed structure consisted of periodic “strips” and,&#13;
being irradiated normally to the glass surface with an IR laser, generated the second harmonic&#13;
(SH) radiation pattern similar to one of a phase diffraction grating. The pattern presented the&#13;
results of an interference of the SH waves generated by nonlinear strips. Mapping of the SH&#13;
radiation pattern in orthogonal polarizations of the fundamental laser beam allowed concluding&#13;
about the distribution of the electric field of electrons captured in the glass.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.107</doi>
          <udk>538.958</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>second harmonic generation</keyword>
            <keyword>glass</keyword>
            <keyword>e-beam lithography</keyword>
            <keyword>grating structure</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.7/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>48-52</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0003-2498-1192</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>I.N. Ulyanov Chuvashia State University</orgName>
              <surname>Lepaev</surname>
              <initials>Alexander</initials>
              <address>Cheboksary, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0002-9723-5652</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>I.N. Ulyanov Chuvashia State University</orgName>
              <surname>Ksenofontov</surname>
              <initials>Sergey</initials>
              <address>Cheboksary, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0001-8432-5635</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>I.N. Ulyanov Chuvashia State University</orgName>
              <surname>Vasilyeva </surname>
              <initials>Olga </initials>
              <address>Cheboksary, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0002-9810-6932</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kudryavtsev</surname>
              <initials>Andrey</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Influence of physical effects on the structure of soot particles of hydrocarbon flames</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The structure of the diffusion flame of TC-1 kerosene has been studied. A film of pyrolytic soot was obtained using the sampling method, and the structural changes of this film under thermal exposure were studied. A new carbon structure – glass carbon was obtained as a result of laser irradiation of highly dispersed carbon black. The mechanism of bubble formation in the glassy carbon structure has been established, and the latent heat of carbon “melting” equal to 2110 J/kg has been determined.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.108</doi>
          <udk>536.46</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>flame</keyword>
            <keyword>soot</keyword>
            <keyword>carbon</keyword>
            <keyword>pyrolysis</keyword>
            <keyword>IR-spectroscopy</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.8/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>53-58</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-8726-9832</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Institute of Automation and Control Processes, Far Eastern Branch of the RAS</orgName>
              <surname>Chernev</surname>
              <initials>Igor</initials>
              <email>igor_chernev7@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Subbotin</surname>
              <initials>Evgenii </initials>
              <email>jons712@mail.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Kozlov</surname>
              <initials>Aleksei</initials>
              <email>kozlov.ag@dvfu.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0009-0002-7285-3224</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Sinotova</surname>
              <initials>Sofia</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0006-2778-8143</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Prikhodchenko</surname>
              <initials>Alena</initials>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0003-0436-0612</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Lembikov</surname>
              <initials>Aleksei</initials>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <orcid>0009-0008-0181-8994</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Prokopeva</surname>
              <initials>Glikeriya</initials>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Goroshko</surname>
              <initials>Dmitrii </initials>
              <email>goroshko@iacp.dvo.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <authorCodes>
              <orcid>0000-0003-4127-2988</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Institute of Automation and Control Processes, Far Eastern Branch of the RAS</orgName>
              <surname>Galkin</surname>
              <initials>Nikolay</initials>
              <email>galkin@iacp.dvo.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Si-based photodetector with an Mg2Si contact layer for SWIR range</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Mg2Si film ~2.3 μm was synthesized by reactive deposition Mg on Si(111) at 340 °C in UHV. The photoresponse of backlighted Al/Si/Mg2Si Schottky structure represents the bell-shaped curve with the peak at 1045 nm and intensity 29 mA/W, 105 mA/W and 195 mA/W under the 0 V, 1 V and 5 V bias respectively with FWHM ~130 nm.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.109</doi>
          <udk>539.23+539.25+539.26+537.32+537.9</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>magnesium silicide</keyword>
            <keyword>silicon</keyword>
            <keyword>films</keyword>
            <keyword>epitaxy</keyword>
            <keyword>reactive epitaxy</keyword>
            <keyword>crystal structure</keyword>
            <keyword>microscopy</keyword>
            <keyword>photoresponse</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.9/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>59-64</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <orgName>Voronezh State University of Engineering Technology</orgName>
              <surname>Kim </surname>
              <initials>Kseniya </initials>
              <email>kmkseniya@yandex.ru</email>
              <address>Voronezh, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0005-4323-9163</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Chernenko</surname>
              <initials>Sergey</initials>
              <email>sergey.x173@mail.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>Voronezh State University of Engineering Technology</orgName>
              <surname>Niftaliev</surname>
              <initials>Sabukhi</initials>
              <email>sabukhi@gmail.com</email>
              <address>Voronezh, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0009-0000-2880-8958</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Frolova</surname>
              <initials>Vera</initials>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <orgName>Voronezh State University</orgName>
              <surname>Grechkina</surname>
              <initials>Margarita</initials>
              <email>grechkina_m@mail.ru</email>
              <address>Voronezh, Russian Federation</address>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0002-9850-8341</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Grigoryan</surname>
              <initials>Gevorg</initials>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Belokopytov</surname>
              <initials>Dmitry</initials>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Chukavin</surname>
              <initials>Andrey</initials>
              <email>andrey_chukawin@mail.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <orgName>Voronezh State University of Engineering Technology</orgName>
              <surname>Lenshin</surname>
              <initials>Alexander</initials>
              <email>lenshinas@mail.ru</email>
              <address>Voronezh, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Copper deposition onto porous silicon by vacuum thermal evaporation</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The morphology and composition of porous silicon samples with thermally evaporated copper coatings were studied using atomic-force microscopy (AFM), infrared spectroscopy (IR), and X-ray photoelectron spectroscopy (XPS). Our research demonstrated that nanocomposites obtained with this method involve both metallic copper and copper oxide. The results indicate that vacuum thermal deposition of copper promotes efficient penetration of this element into the porous silicon structure and retards the oxidation process of the porous layer during long-term storage in the atmosphere.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.110</doi>
          <udk>546.3-126:544.2</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>porous silicon</keyword>
            <keyword>composites</keyword>
            <keyword>thin films</keyword>
            <keyword>copper</keyword>
            <keyword>vacuum-thermal sputtering</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.10/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>65-70</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <orgName>National Research University of Electronic Technology</orgName>
              <surname>Vasilevsky </surname>
              <initials>Pavel </initials>
              <email>pavelvasilevs@yandex.ru</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <orgName>National Research University of Electronic Technology</orgName>
              <surname>Savelyev</surname>
              <initials>Mikhail</initials>
              <email>nanonlin@yandex.ru</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>National Research University of Electronic Technology</orgName>
              <surname>Gerasimenko</surname>
              <initials>Alexander</initials>
              <email>gerasimenko@bms.zone</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Nonlinear absorption of laser radiation in the carbon nanotubes dispersions in ultraviolet and visible ranges</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Carbon nanotubes have unique properties and applications in various fields such as nonlinear optics, flexible electronics, biocompatible composites for tissue repair, etc. The properties of carbon nanotubes can be tuned when exposed to laser radiation. The manifestation of nonlinear absorption properties can improve the methods of formation and processing of materials containing carbon nanotubes. In this work, the properties of nonlinear absorption in the ultraviolet (355 nm) and visible (532 nm) ranges depending on the type of carbon nanotubes and the type of solvent are investigated. The study was performed using the Z-scan method with pulsed exposure (pulse duration is 20 ns). It was shown that the homogeneity of the carbon nanotubes distribution in a liquid medium affects the nonlinear absorption of laser radiation. Single-walled carbon nanotubes in dimethylformamide showed the best nonlinear absorption coefficient and the lowest threshold fluence when the interaction of the medium with laser radiation becomes nonlinear. The demonstrated laser stability of nanotubes also makes them a promising material for laser radiation limiters and nonlinear optical switchers.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.111</doi>
          <udk>535.015</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>laser radiation</keyword>
            <keyword>nonlinear absorption</keyword>
            <keyword>carbon nanotubes</keyword>
            <keyword>UV range</keyword>
            <keyword>visible range</keyword>
            <keyword>nanosecond pulses</keyword>
            <keyword>Z-scan</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.11/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>71-76</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-5760-1523</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Sosunov </surname>
              <initials>Aleksei </initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0002-3110-668X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Petukhov</surname>
              <initials>Igor</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-8267-0168</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kornilicyn</surname>
              <initials>Andrey</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0003-3053-1892</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Mololkin</surname>
              <initials>Anatoliy</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0006-1447-3310</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Umylin</surname>
              <initials>Vladislav</initials>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0003-1077-7975</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Fakhrtdinov</surname>
              <initials>Rashid</initials>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <orcid>0000-0002-6040-6403</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kulikov</surname>
              <initials>Anton</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Annealed proton-exchange waveguides in mixed lithium niobate-tantalate solid solutions</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Annealed proton-exchange (APE) waveguides in lithium niobate are widely used in integrated photonics for navigation, telecommunications and electric field sensors. In this paper, we analyze the characteristics of planar APE waveguides in new mixed single crystals of lithium niobate-tantalate solid solution by various methods (prism coupling, XRD and IR spectroscopy). The elemental composition (ratio Nb/Ta) of Z-cut mixed lithium niobate-tantalate samples gives a good uniform distribution over the all-surface area by X-ray fluorescence method. APE waveguides in mixed lithium niobate-tantalate single crystals are characterized by a lower value of refractive index increment due to Ta atoms and higher proton diffusion coefficients due to lattice disordering. High diffusion coefficients provide a deeper APE waveguide layer and rapid recovery of the crystal lattice during post-exchange annealing. These results expand the understanding of the proton exchange process in mixed lithium niobate-tantalate solid solutions for the creation of single-mode APE waveguides.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.112</doi>
          <udk>535.3, 544.015</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>optical materials</keyword>
            <keyword>lithium niobate-tantalate</keyword>
            <keyword>APE waveguides</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.12/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>77-80</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0005-0782-8569</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Moroz</surname>
              <initials>Alexey</initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-9602-9868</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Chistikov</surname>
              <initials>Ilia</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0003-3741-3936</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Ioffe Physical Technical Institute of the Russian Academy of Sciences</orgName>
              <surname>Melehin </surname>
              <initials>Vladimir </initials>
              <email>melekhin1952@gmail.com</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>Peter the Great St. Petersburg Polytechnic University Alferov University</orgName>
              <surname>Kaasik </surname>
              <initials>Vladimir </initials>
              <email>vkaasik@yandex.ru </email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Thermal poling of photosensitive glasses containing Ag+ and Ce3+ ions</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">We present the results on the crystallization of photo-thermo-refractive glass under thermal poling and ultraviolet (UV) irradiation followed by heat treatment. Poling was carried out at a temperature of 300 °C and a voltage of 400−1000 V. A femtosecond laser with a wavelength of 343 nm was used as UV sources. The studies were carried out using optical microscopy, optical absorption and Raman scattering. It is shown that in the subanode layer of the glass after poling, subsequent UV irradiation and heat treatment, crystallization of glass is completely suppressed. After the poling and the heat treatment cesium ions are also recharged in this layer Ce3+ → Ce4+. The mechanisms of the crystallization suppression and ion recharge in the poled region of the glass are discussed.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.113</doi>
          <udk>53.043</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>photosensitive glass</keyword>
            <keyword>thermal poling</keyword>
            <keyword>UV irradiation</keyword>
            <keyword>heat treatment</keyword>
            <keyword>crystallization</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.13/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>81-84</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-3469-5897</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Kondratev</surname>
              <initials>Valeriy</initials>
              <email>kvm_96@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-6869-1213</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Vyacheslavova</surname>
              <initials>Ekaterina</initials>
              <email>cate.viacheslavova@yandex.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-4110-1647</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Shugabaev</surname>
              <initials>Talgat</initials>
              <email>talgashugabaev@mail.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0001-7223-7232</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Moscow Institute of Physics and Technology (National Research University)</orgName>
              <surname>Bolshakov</surname>
              <initials>Alexey</initials>
              <email>acr1235@mail.ru</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Modification of silicon nanowires with silver nanoparticles for gas sensor applications</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">This study focuses on methods to modify the adsorption properties of silicon nanowires produced through plasma cryogenic etching. This research demonstrates the potential for synthesizing a nanocomposite composed of silicon nanowires and silver nanoparticles, which can be utilized to develop highly efficient gas sensors.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.114</doi>
          <udk>538.91</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>nanowires</keyword>
            <keyword>selective adsorption sensor</keyword>
            <keyword>electrical impedance spectroscopy</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.14/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>85-90</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-5183-6807</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Vasilevskaya </surname>
              <initials>Yulia </initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0006-1375-6191</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Chumachenko</surname>
              <initials>Julia</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Aggregation kinetics of silver nanoparticles ensembles in sub-percolating state and its impact on memristive behaviour</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The effect of coalescence and aggregation processes on the memristive properties of silver nanoparticle assemblies has been investigated. Nanoparticles were prepared by vacuum-thermal evaporation on silicon substrates with gold electrodes and quartz glasses for morphological control. The structure of the samples and size distribution of nanoparticles were studied using scanning electron microscopy (SEM) and UV-visible spectroscopy. Memristive properties were estimated using cyclic voltammetry. Due to Ostwald ripening and an increase in average nanoparticle size, the operating voltage required to switch the system into the memristive state decreased, while the conductivity dynamics changed. These findings are useful for ensuring the stability of memristive devices based on silver nanoparticle assemblies.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.115</doi>
          <udk>539.219.3</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>coalescence</keyword>
            <keyword>silver nanoparticles</keyword>
            <keyword>surface plasmon resonance</keyword>
            <keyword>memristive dynamics</keyword>
            <keyword>surface diffusion</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.15/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>91-94</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-4513-6345</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Ruzhevich </surname>
              <initials>Maxim </initials>
              <email>max.ruzhevich@niuitmo.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0007-1056-5100</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>ITMO University</orgName>
              <surname>Kirilenko</surname>
              <initials>Iaroslav </initials>
              <email>idkirilenko@itmo.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>St. Petersburg Electrotechnical University "LETI"</orgName>
              <surname>Chumanov </surname>
              <initials>Ivan </initials>
              <email>chumanov2000@yandex.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>St. Petersburg Electrotechnical University "LETI"</orgName>
              <surname>Firsov</surname>
              <initials>Dmitrii</initials>
              <email>d.d.firsov@gmail.com</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <orgName>St. Petersburg Electrotechnical University "LETI"</orgName>
              <surname>Komkov </surname>
              <initials>Oleg </initials>
              <email>oleg_sergeevich@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Mynbaev</surname>
              <initials>Karim</initials>
              <email>mynkad@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <orcid>0000-0002-9989-3843</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Romanov</surname>
              <initials>Viacheslav</initials>
              <email>romanovvv@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Moiseev</surname>
              <initials>Konstantin</initials>
              <email>mkd@iropt2.ioffe.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Optical studies of InAs/InAsSb/InAsSbP heterostructures</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Fourier-transform infrared photoluminescence and photoreflectance were used to study the optical properties of InAs/InAsSbP and InAs/InAsSb/InAsSbP heterostructures. A strong dependence of chemical composition and optical quality of the top InAsSbP barrier layers on the composition of the material on which the layer was grown has been established.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.116</doi>
          <udk>538.91</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>heterostructures</keyword>
            <keyword>InAsSbP</keyword>
            <keyword>photoluminescence</keyword>
            <keyword>photoreflectance</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.16/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>95-98</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0004-1245-1391</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Voitovich </surname>
              <initials>Veronica</initials>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <orgName>National Research University ‘Higher School of Economics”</orgName>
              <surname>Makhov</surname>
              <initials>Ivan</initials>
              <email>imahov@hse.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>ITMO University</orgName>
              <surname>Andryushkin</surname>
              <initials>Vladislav</initials>
              <email>vvandriushkin@itmo.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Kopytov</surname>
              <initials>Pavel</initials>
              <email>kopytovpe@itmo.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0001-3683-5558</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>ITMO University</orgName>
              <surname>Papylev</surname>
              <initials>Denis</initials>
              <email>dspapylev@itmo.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Kryzhanovskaya Natalia V.</surname>
              <initials>Natalia</initials>
              <email>nkryzhanovskaya@hse.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <scopusid>35379962200</scopusid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Ioffe Physical Technical Institute of the Russian Academy of Sciences</orgName>
              <surname>Zhukov</surname>
              <initials>Alexey</initials>
              <email>zhukov@beam.ioffe.ru</email>
              <address>Russia, 194021, St.Petersburg, Polytechnicheskaya 26</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Photoluminescence of InGaAs/InAlAs short-period superlattices grown on InP substrate</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The photoluminescence spectra of short-period InGaAs/InAlAs superlattices&#13;
emitting in the 1.3 µm spectral range were investigated in the wide range of pumping powers&#13;
at the temperatures of 5−300 K. The 5 K photoluminescence spectra consisted of luminescence&#13;
bands associated with radiative electron-hole recombination in superlattices as well as in the&#13;
InP substrate and buffer layers of heterostructures. Spectral positions of superlattice emission&#13;
bands are in a good agreement with calculated values obtained with transfer matrix method for&#13;
all the samples. The temperature evolution of emission spectra was investigated as well.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.117</doi>
          <udk>535.3</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>superlattice</keyword>
            <keyword>photoluminescence</keyword>
            <keyword>VCSEL</keyword>
            <keyword>temperature quenching</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.17/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>99-104</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <orgName>Voronezh State University of Engineering Technology</orgName>
              <surname>Lenshin</surname>
              <initials>Alexander</initials>
              <email>lenshinas@mail.ru</email>
              <address>Voronezh, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0003-0123-9526</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Polkovnikova</surname>
              <initials>Yulia</initials>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>Voronezh State University of Engineering Technology</orgName>
              <surname>Chernousova</surname>
              <initials>Olga</initials>
              <email>byolval@mail.ru</email>
              <address>Voronezh, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0009-0000-2880-8958</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Frolova</surname>
              <initials>Vera</initials>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Domashevskaya</surname>
              <initials>Evelina</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Composition and properties of porous silicon nanoparticles with deposited cinnarizine</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">As a result of our work samples of nanopowders of porous silicon with the deposited cinnarizine were obtained and technique of the chemical deposition of cinnarizine into the porous layer was elaborated. The obtained structures of porous silicon can be used for delivery of various therapeutic agents starting from small molecules of the preparations up to the large peptides/protein therapeutic agents while controlling composition of the surface and morphology of the porous layer. Nanopowder of porous silicon was obtained by mechanical and ultrasound grinding of the porous silicon wafers. Using transmission electron microscopy, infrared and ultraviolet spectroscopy morphology and composition of the porous silicon samples were studied. According to the results of transmission electron microscopy (TEM) a presence of both crystalline and amorphous phases was determined. Chemical composition and types of the bonds in the porous silicon layer was studied according to the data of infrared (IR) spectroscopy. The data on ultraviolet (UV) allowed to determine the energy of the possible direct transitions in nanostructures. Adsorption and desorption processes in nanostructures were studied.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.118</doi>
          <udk>538.9</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>mesoporous silicon</keyword>
            <keyword>nanopowders</keyword>
            <keyword>nanopowders</keyword>
            <keyword>spectroscopy</keyword>
            <keyword>cinnarizine</keyword>
            <keyword>systems of drug delivery</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.18/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>105-109</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-8319-1492</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Pozdniakov </surname>
              <initials>Stepan </initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0009-5076-6470</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Matveeva</surname>
              <initials>Elizaveta</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0009-0009-6600-0592</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Li</surname>
              <initials>Shixiong</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0001-9923-3995</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Sandzhieva</surname>
              <initials>Maria</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0000-0002-9257-6183</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Makarov</surname>
              <initials>Sergey</initials>
              <email>s.makarov@metalab.ifmo.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Enhanced optical performance of FAPbBr3-MOF composite films</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Metal halide perovskite nanocrystals have emerged as excellent candidate materials for various optoelectronic applications due to their distinguished optoelectronic properties. However, suffering from instability under environmental conditions such as humidity, temperature and ultraviolet radiation restricts its further development and larger-scale application. In this study, we present a one-step method for fabricating composite thin films of formamidinium lead bromide and a lead-based metal-organic framework with enhanced stability. Meanwhile, the obtained composite films exhibited a low amplified spontaneous emission threshold of 12.3 μJ·cm−2 enhancing their potential for efficient optoelectronic applications, including light-emitting devices and lasers.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.119</doi>
          <udk>538.975</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>perovskite</keyword>
            <keyword>metal-organic framework</keyword>
            <keyword>composites</keyword>
            <keyword>enhanced spontaneous emission</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.19/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>110-113</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0007-3942-7908</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kan </surname>
              <initials>Gennadiy </initials>
              <email>gennadiykang@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0009-4341-4346</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Cui</surname>
              <initials>Zhihao</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-1744-5976</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Terpitskiy </surname>
              <initials>Aleksey </initials>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Scherbak</surname>
              <initials> Sergey </initials>
              <email>sergeygtn@yandex.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <orgName>Peter the Great St. Petersburg Polytechnic University </orgName>
              <surname>Zhurikhina</surname>
              <initials>Valentina</initials>
              <email>zhurikhina@mail.edu.ioffe.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Analysis of nonlinear susceptibility in ion-exchanged glass</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">We demonstrate that electric-field-assisted ion-exchange in glass allows one to obtain a structure with close to a step-like concentration and conductivity profiles. Application of DC voltage to the ion-exchanged glass results in charge accumulation. The electric field induces symmetry breaking and provides quadratic optical susceptibility in the glass. Nonlinear optical properties of modified glass are studied using the Maker fringe technique. Particularly, we study the influence of the nonlinear susceptibility tensor components ratio \(χ_{zxx} : χ_{zzz} \) on resulting characteristics. Comparing modeling and experiments, we deduced the ratio 1:3 which corresponds to Kleinman symmetry of isotropic materials.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.120</doi>
          <udk>535.016</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>glass</keyword>
            <keyword>ion-exchange</keyword>
            <keyword>second harmonic generation</keyword>
            <keyword>EFISH phenomenon</keyword>
            <keyword>phase-matching</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.20/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>114-118</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-7829-5326</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Adamovich </surname>
              <initials>Artem </initials>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Golovanov</surname>
              <initials>Victor</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0009-6999-9030</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Makhmud-Akhunov</surname>
              <initials>Marat</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0002-8612-6258</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Yavtushenko</surname>
              <initials>Igor</initials>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Soloviev</surname>
              <initials>Andrei</initials>
              <email>asus_work@mail.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Bodnarsky</surname>
              <initials>Dmitry</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Сapacitive properties of composite electrodes based on polyaniline and nanoporous titanium oxide obtained by plasma-electrolytic oxidation</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The capacitive characteristics of composite electrodes based on nanoporous titanium oxide obtained by plasma electrolytic oxidation are considered. It is shown that the specific capacitance of a multilayer supercapacitor based on formed titanium oxide and polyaniline (PANI) is 10 mF/cm2. The resulting oxide layers have a crystalline structure, providing minimal faradaic resistance, which is promising for use in electrochemical double-layer supercapacitors.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.121</doi>
          <udk>537.9</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>titanium</keyword>
            <keyword>electrolyte plasma</keyword>
            <keyword>nanoporous oxide</keyword>
            <keyword>polyaniline</keyword>
            <keyword>supercapacitor</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.21/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>119-124</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0001-7499-0578</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Institute of High Current Electronics, Siberian Branch of RAS</orgName>
              <surname>Kozhevnikov</surname>
              <initials>Vasily</initials>
              <email>Vasily.Y.Kozhevnikov@ieee.org</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Kozyrev</surname>
              <initials>Andrey</initials>
              <email>kozyrev@to.hcei.tsc.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">The phenomenon of “anomalous electrons” in pulsed high-current vacuum discharges</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">This paper presents the first comprehensive theoretical explanation, based on computational physical kinetics, for the phenomenon of electrons attaining energies exceeding the amplitude of the applied voltage (in eV units) in a vacuum diode. The proposed theory thoroughly elucidates the existence of so-called “anomalous electrons”, detailing their generation dynamics and underlying mechanisms. Additionally, the work calculates the integral energy spectra of these anomalous electrons in a high-current pulsed vacuum discharge and quantifies their contribution to the total current flow. The main tool used for numerical calculations is the latest meshless method for solving Vlasov-Poisson equation systems, known as the numerical flow iteration method (NuFI). The findings provide critical insights into non-equilibrium electron behaviour under extreme conditions, advancing the understanding of electron transport in vacuum-based high-power devices.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.122</doi>
          <udk>533.9.02</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>vacuum electronics</keyword>
            <keyword>anomalous electrons</keyword>
            <keyword>physical kinetics</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.22/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>125-128</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0005-4578-7550</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Masyutin </surname>
              <initials>Dmitriy </initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0004-6609-9741</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Rudnev</surname>
              <initials>Artem</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0003-3686-935X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>National Research University “Higher School of Economics” (St. Petersburg branch)</orgName>
              <surname>Moiseev</surname>
              <initials>Eduard</initials>
              <email>emoiseev@hse.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Vainilovich</surname>
              <initials>Alexey</initials>
              <email>a.vainilovich@ifanbel.bas-net.by</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Lutsenko</surname>
              <initials>Eugeniy</initials>
              <email>e.lutsenko@ifanbel.bas-net.by</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Tsatsulnikov</surname>
              <initials>Andrey</initials>
              <email>andrew@beam.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Sakharov</surname>
              <initials>Alexey</initials>
              <email>val@beam.ioffe.rssi.ru</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Arteev </surname>
              <initials>Dmitri </initials>
              <email>ArteevDS@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <surname>Nikolaev</surname>
              <initials>Andrei</initials>
              <email>Aen@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="010">
            <authorCodes>
              <orcid>0000-0002-2313-9051</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Pivovarova</surname>
              <initials>Antonina</initials>
            </individInfo>
          </author>
          <author num="011">
            <individInfo lang="ENG">
              <surname>Zavarin</surname>
              <initials>Evgenii </initials>
              <email>EZavarin@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="012">
            <individInfo lang="ENG">
              <surname>Il'inskaya</surname>
              <initials>Natalya</initials>
              <email>Natalya.Ilynskaya@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="013">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Markov</surname>
              <initials>Lev</initials>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="014">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Smirnova</surname>
              <initials>Irina</initials>
              <email>irina@quantum.ioffe.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="015">
            <individInfo lang="ENG">
              <surname>Kryzhanovskaya Natalia V.</surname>
              <initials>Natalia</initials>
              <email>nkryzhanovskaya@hse.ru</email>
            </individInfo>
          </author>
          <author num="016">
            <authorCodes>
              <scopusid>35379962200</scopusid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Ioffe Physical Technical Institute of the Russian Academy of Sciences</orgName>
              <surname>Zhukov</surname>
              <initials>Alexey</initials>
              <email>zhukov@beam.ioffe.ru</email>
              <address>Russia, 194021, St.Petersburg, Polytechnicheskaya 26</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Investigation of microdisks lasers with an InGaN/GaN quantum well in the active region at elevated temperatures</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In this work, we present results on high-temperature operation microdisk lasers with an active region based on InGaN/GaN quantum wells. The diameter of the microdisks was 5 μm. The photoluminescence spectra measured in the temperature range from 25 °С to 100 °С. The temperature stability lasing is demonstrated.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.123</doi>
          <udk>535.372:621.315.592</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>GaN</keyword>
            <keyword>InGaN/GaN quantum wells</keyword>
            <keyword>microdisk resonator</keyword>
            <keyword>WGM</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.23/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>129-134</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-9733-751X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Shipenok </surname>
              <initials>Xenia</initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0007-6517-9784</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Mazhikenova</surname>
              <initials>Aliya</initials>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Glukhovskoy</surname>
              <initials>Evgeny</initials>
              <email>Glukhovskoy@gmail.com</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Shipovskaya </surname>
              <initials>Anna </initials>
              <email>Shipovskayaab@yandex.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Surface tension measurement of chitosan aspartate nanoparticle dispersions by a modified Wilhelmy method</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">A modification of the Wilhelmy method is proposed for measuring the surface tension of polymer nanoparticle dispersions, whose key feature is the static nature of the Wilhelmy plate when measuring the surface tension force. Tests on the example of nanostructured chitosan aspartate showed satisfactory accuracy of the modified method in estimating the surface activity of nanodispersions in a wide range of polymer concentrations. The concentration dependence of the surface tension of the dispersion of chitosan aspartate nanoparticles was obtained, and concentration ranges with different surface effects were outlined. The contribution of individual components used in obtaining nanoparticles to the surface activity of the nanodispersion was estimated.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.124</doi>
          <udk>547.458:[544+532.61]</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>chitosan</keyword>
            <keyword>L- and D-aspartic acid</keyword>
            <keyword>nanoparticles</keyword>
            <keyword>surface tension</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.24/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>135-138</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-6342-8448</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Vasin </surname>
              <initials>Sergei </initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0007-9634-0745</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kuzmin</surname>
              <initials>Nikolai</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0003-4854-2813</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Sergeev</surname>
              <initials>Viacheslav</initials>
              <email>sva@ulstu.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0001-6541-2637</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Buzaeva</surname>
              <initials>Mariya</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Study of thermal conductivity of polymer materials with carbon nanotubes using laser flash method</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The thermal conductivity of nanocomposite polymer materials based on polyvinyl alcohol and epoxy resin with the inclusion of multi-walled carbon nanotubes was studied using the laser flash method. The possibility of using the laser flash method to determine thermal conductivity in thin-film polymer materials is demonstrated and its features are revealed. It has been shown that the presence of carbon nanotubes in polymer matrices leads to an increase in the coefficients of thermal diffusivity and thermal conductivity by several times compared to pure polymer materials.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.125</doi>
          <udk>539.23</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>carbon nanotubes</keyword>
            <keyword>polymers</keyword>
            <keyword>thermal conductivity</keyword>
            <keyword>laser flash method</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.25/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>139-142</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Gridchin </surname>
              <initials>Vladislav</initials>
              <email>gridchinvo@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Mintairov</surname>
              <initials>Alexander</initials>
              <email>amintairov@mail.ioffe.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-4110-1647</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Shugabaev</surname>
              <initials>Talgat</initials>
              <email>talgashugabaev@mail.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Axenov</surname>
              <initials>Valerii</initials>
              <email>axenov.v@gmail.com</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Vlasov</surname>
              <initials>Alexei</initials>
              <email>vlasov@scell.ioffe.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Lendyashova </surname>
              <initials>Vera </initials>
              <email>erilerican@gmail.com</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Kotlyar</surname>
              <initials>Konstantin</initials>
              <email>konstantin21kt@gmail.com</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Eliseev</surname>
              <initials>Ilya</initials>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <orgName>St. Petersburg State University</orgName>
              <surname>Khrebtov</surname>
              <initials>Artem</initials>
              <email>khrebtovart@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="010">
            <individInfo lang="ENG">
              <surname>Reznik</surname>
              <initials>Rodion </initials>
              <email>moment92@mail.ru</email>
            </individInfo>
          </author>
          <author num="011">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Davydov</surname>
              <initials>Valery</initials>
              <email>Valery.Davydov@mail.ioffe.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="012">
            <individInfo lang="ENG">
              <surname>Cirlin</surname>
              <initials>George </initials>
              <email>george.cirlin@mail.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Growth of GaN nanowires with InN inserts by PA-MBE</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">For the first time, the growth details and photoluminescence properties of ultra-thin InN insertions embedded in GaN nanowires are presented. The InN insertions embedded in GaN nanowires exhibit photoluminescence in the range of 2.9–3.35 eV, where the most intense emission line at 3.17–3.23 eV is tentatively attributed to monolayer-thick InN insert based on comparative spectral analysis. These findings can be promising for the development of single-photon sources and Wigner quantum dots operating from cryogenic to elevated temperatures.</abstract>
        </abstracts>
        <codes>
          <doi>/10.18721/JPM.183.126</doi>
          <udk>538.975</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>InN</keyword>
            <keyword>GaN</keyword>
            <keyword>MBE</keyword>
            <keyword>quantum dots</keyword>
            <keyword>nanowires</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.26/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>143-147</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Arteev </surname>
              <initials>Dmitri </initials>
              <email>ArteevDS@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Sakharov</surname>
              <initials>Alexey</initials>
              <email>val@beam.ioffe.rssi.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Nikolaev</surname>
              <initials>Andrei</initials>
              <email>Aen@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Zavarin</surname>
              <initials>Evgenii </initials>
              <email>EZavarin@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0000-0002-2793-5717</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Peter the Great St. Petersburg Polytechnic University</orgName>
              <surname>Filimonov</surname>
              <initials>Alexey</initials>
              <email>filimonov@rphf.spbstu.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Tsatsulnikov</surname>
              <initials>Andrey</initials>
              <email>andrew@beam.ioffe.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Optical reflectance spectroscopy for barrier thickness measurement of AlGaN/GaN heterostructures: comparison with X-ray reflectometry</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">This study evaluates optical reflectance (OR) spectroscopy as a rapid, cost-effective alternative to X-ray reflectometry (XRR) for measuring the thickness of the AlGaN barrier layer in AlGaN/GaN heterostructures. OR spectroscopy demonstrated excellent agreement with XRR, with deviations not exceeding 1 nm. The results highlight OR spectroscopy as an efficient and reliable method for routine characterization of GaN-based heterostructures.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.127</doi>
          <udk>621.315.592</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>gallium nitride</keyword>
            <keyword>AlGaN/GaN</keyword>
            <keyword>heterostructure</keyword>
            <keyword>optical reflectance spectroscopy</keyword>
            <keyword>X-ray reflectance</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.27/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>148-151</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Andreeva  </surname>
              <initials>Anna</initials>
              <email>aa5991696@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Ilkiv</surname>
              <initials>Igor </initials>
              <email>fiskerr@ymail.com</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Kotlyar</surname>
              <initials>Konstantin</initials>
              <email>konstantin21kt@gmail.com</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>St. Petersburg State University</orgName>
              <surname>Khrebtov</surname>
              <initials>Artem</initials>
              <email>khrebtovart@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Gridchin </surname>
              <initials>Vladislav</initials>
              <email>gridchinvo@gmail.com</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Cirlin</surname>
              <initials>George </initials>
              <email>george.cirlin@mail.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Reznik</surname>
              <initials>Rodion </initials>
              <email>moment92@mail.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">MBE growth of wurtzite AlGaAs nanowires with zinc-blende insertions</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In this work we present the experimental results on the molecular-beam epitaxy growth of wurtzite AlGaAs nanowires with nanoscale zinc-blende insertions on silicon substrate. Structural characterization confirmed the formation of zinc-blende nanoscale segments within the wurtzite nanowire matrix. Autocorrelation function measurements for emission at&#13;
710 nm have shown the characteristic dip at zero time delay, which indicates that the synthesized nanostructures are sources of single photons.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.128</doi>
          <udk>538.9</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>nanowires</keyword>
            <keyword>AlGaAs</keyword>
            <keyword>quantum dots</keyword>
            <keyword>wurtzite</keyword>
            <keyword>molecular-beam epitaxy</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.28/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>152-155</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Lendyashova </surname>
              <initials>Vera </initials>
              <email>erilerican@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Kotlyar</surname>
              <initials>Konstantin</initials>
              <email>konstantin21kt@gmail.com</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>St. Petersburg State University</orgName>
              <surname>Khrebtov</surname>
              <initials>Artem</initials>
              <email>khrebtovart@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Cirlin</surname>
              <initials>George </initials>
              <email>george.cirlin@mail.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Ilkiv</surname>
              <initials>Igor </initials>
              <email>fiskerr@ymail.com</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Effect of GaAs buffer layer on the characteristics of GaAs nanowires grown by molecular beam epitaxy on Si(111) substrates</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The possibility of depositing colloidal nanoparticles onto an amorphous GaAs layer grown on Si(111) substrates and the direct molecular beam epitaxy of size-uniform GaAs nanowires with diameters below 20 nm were demonstrated. Examination of the nanowires revealed a nearly pure wurtzite crystal structure with low stacking fault density.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.129</doi>
          <udk>538.975</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>nanowire</keyword>
            <keyword>molecular beam epitaxy</keyword>
            <keyword>semiconductors</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.29/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>156-160</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0006-2524-7618</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Boitsova </surname>
              <initials>Natalia </initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0003-3859-6981</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Abelit</surname>
              <initials>Anna</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-3756-0701</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Verlov</surname>
              <initials>Nikolai</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0002-5470-9301</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Stupin</surname>
              <initials>Daniil</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Noises in bioelectronic devices: a case study of electromagnetic interference in biolaboratory facilities</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Since bioelectrical signals typically have amplitudes below μA and lower than mV, their measurement is significantly susceptible to environmental electromagnetic interference (EMI). In this study, we measured and analyzed the levels of electromagnetic interference in biolaboratory rooms – the birthplace and preliminary test center for any bioelectronic device. We have shown that in an ordinary biolaboratory, which is equipped with typical modern instruments, like digital microscopes, EMI in the sub-250 kHz range can include both periodic and wide-band signals, which can influence the working of impedance sensors and neuroprosthetic implants. The results of our study can be used for the development and testing of noise-suppression systems for bioelectronics applications.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.130</doi>
          <udk>534.852.6</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>electromagnetic interference</keyword>
            <keyword>noise</keyword>
            <keyword>impedance devices</keyword>
            <keyword>spectra analysis</keyword>
            <keyword>neuroprosthetic care</keyword>
            <keyword>multielectrode arrays</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.30/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>161-164</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <orgName>Southern Federal University</orgName>
              <surname>Klimin</surname>
              <initials>Viktor</initials>
              <email>kliminvs@sfedu.ru</email>
              <address>Rostov-on-Don, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-9326-2349</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Demyanenko</surname>
              <initials>Alexander</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-6923-7917</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Bobkov</surname>
              <initials>Ivan</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Metamaterials formed on the surface of silicon carbide by plasma treatment</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In the presented work, a unit cell of a self-complementary metamaterial was designed, which is alternating patches and holes in a conductive graphene-like layer 7 μm thick on a silicon carbide substrate 250 μm thick. The results of a numerical study of the developed structure are presented. The calculations considered the conductivity of the graphene-like film, as well as the dielectric parameters of the silicon carbide substrate. The developed metamaterial is designed to convert circular polarization into linear; the central operating frequency of the resulting structure is 10 GHz. The dimensions of the unit cell are 2.8 mm × 5.6 mm. The elements obtained can be used in microwave technology and antenna structures. For the manufacture of structures, it is planned to use the method of plasma-chemical etching of silicon carbide in a fluorine-containing gas environment, which destroys the silicon component and leaves a graphene-like conductive layer on the surface. The thickness of the graphene-like layer depends on the power of the inductively coupled plasma source and the processing time; in this work, a thickness of 7 µm was taken, obtained at 800 W and 8.5 minutes of etching SiC in an SF6/Ar atmosphere.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.131</doi>
          <udk>621.35.035</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>plasma etching</keyword>
            <keyword>metamaterials</keyword>
            <keyword>graphene-like film</keyword>
            <keyword>silicon carbide</keyword>
            <keyword>microelectronics</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.31/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>165-168</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <orgName>Southern Federal University</orgName>
              <surname>Klimin</surname>
              <initials>Viktor</initials>
              <email>kliminvs@sfedu.ru</email>
              <address>Rostov-on-Don, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-8635-2573</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Gusev</surname>
              <initials>Evgeny</initials>
              <email>eyugusev@sfedu.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-9329-0662</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Polyakov</surname>
              <initials>Vadim</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0009-0000-7843-9839</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Tarasov</surname>
              <initials>Pavel</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0001-1684-1475</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Grigoryev</surname>
              <initials>Mikhail</initials>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Wang</surname>
              <initials>Shumeng</initials>
              <email>smwang@sdlaser.cn</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Wang</surname>
              <initials>Zhaowei</initials>
              <email>zw.wang@qlu.edu.cn</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Jiang</surname>
              <initials>Liyuan</initials>
              <email>jiangliyuan@sdlaser.cn</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <surname>Zhang</surname>
              <initials>Wei</initials>
              <email>zhang.wei@qlu.edu.cn</email>
            </individInfo>
          </author>
          <author num="010">
            <individInfo lang="ENG">
              <orgName>Southern Federal University</orgName>
              <surname>Ageev</surname>
              <initials>Oleg</initials>
              <email>ageev@sfedu.ru</email>
              <address>Taganrog, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">All-silicon elements of terahertz photonics obtained by plasma etching</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In the presented study, nanostructures on a silicon substrate were experimentally formed using the plasma-chemical etching method in a combined discharge plasma. The main objective was to analyze the relationship between the plasma-chemical etching process parameters and the structure geometry, namely: the deviation angle from the vertical, the height of the elements, and deviations from the nominal dimensions. Particular attention was paid to the influence of the active gas concentration, the power of the inductively coupled plasma source (ICP), and the power of the capacitively coupled source (CCP, bias voltage) on the structure geometry. The resulting nanostructures are considered as potential elements of terahertz photonics of metasurfaces. For example, process settings with an ICP power of 400 W, an active gas volume fraction of 7%, and a bias voltage of 101 V made it possible to obtain structures with a height of 136 nm, deviating from the specified dimensions by only 2% (98% compliance).</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.132</doi>
          <udk>66.087.3</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>all-silicon elements</keyword>
            <keyword>terahertz photonics</keyword>
            <keyword>metamaterials</keyword>
            <keyword>plasma etching</keyword>
            <keyword>microelectronics</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.32/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>169-172</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <orgName>Southern Federal University</orgName>
              <surname>Klimin</surname>
              <initials>Viktor</initials>
              <email>kliminvs@sfedu.ru</email>
              <address>Rostov-on-Don, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0000-7843-9839</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Tarasov</surname>
              <initials>Pavel</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0009-0001-1684-1475</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Grigoryev</surname>
              <initials>Mikhail</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0009-0007-7197-9104</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Gavrish</surname>
              <initials>Polina</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0007-2496-9317</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Tkacheva</surname>
              <initials>Anastasia</initials>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0009-0005-7668-4079</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Ptashnik</surname>
              <initials>Vitaly</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Formation of a graphene-like conductive film on the surface of SiC by laser destruction of silicon</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">This study is devoted to the formation of conductive graphene-like layers on the surface of silicon carbide by laser removal of silicon in local zones. The work demonstrates the effect of the laser system pulse frequency on the thickness and electrical conductivity of the resulting conductive graphene-like layer on a silicon carbide plate. In addition, optimal parameters for obtaining a conductive coating and the required surface roughness suitable for designing antenna devices are determined. At a frequency of 100 kHz, conductive graphene films of the coating with a thickness of 6.5 μm were obtained, while the modified zone was 93% of the total impact area. The thickness of the conductive layer in the local zone processed at a frequency of 40 kHz reached 5 μm, and at a frequency of 120 kHz − 7 μm. The results demonstrate the potential for the development and creation of sensor elements, optoelectronics and photonics devices.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.133</doi>
          <udk>621.315.</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>graphene</keyword>
            <keyword>laser destruction</keyword>
            <keyword>silicon carbide</keyword>
            <keyword>microelectronics</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.33/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>173-177</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-7746-3009</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Rybalka</surname>
              <initials>Sergey</initials>
              <email>sbrybalka@yandex.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0001-4724-3734</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Brundasov </surname>
              <initials>Daniil </initials>
              <email>kineticx@bk.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-7294-7549</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kulchenkov</surname>
              <initials>Evgeny</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0002-8639-3575</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Demidov</surname>
              <initials>Andrey</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">The operational amplifiers radiation hardness experimental study</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The radiation hardness of the operational amplifiers IS-OU2 and LM358 has been performed experimentally using X-ray research complex. It was found that the measured characteristics of operational amplifiers (input offset voltage, consumption current, voltage gain) for the IS-OU2 and its analogue LM358 are similar and demonstrate radiation hardness. As a result, the designed and produced IS-OU2 operational amplifier can be used for producing of spacecraft equipment electronics that can operate under space radiation conditions.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.134</doi>
          <udk>537.312.54; 621.375.4</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>operational amplifiers</keyword>
            <keyword>X-ray irradiation</keyword>
            <keyword>ionizing dose effects</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.34/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>178-181</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0005-3723-5924</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Federal State Budgetary Institution of Science K.A. Valiev Institute of Physics and Technology of the RAS Yaroslavl Branch</orgName>
              <surname>Morozov </surname>
              <initials>Matvey </initials>
              <email>matvey11212@gmail.com</email>
              <address>Yaroslavl, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Uvarov </surname>
              <initials>Ilia </initials>
              <email>i.v.uvarov@bk.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">MEMS switch with an intermediate electrode for high-speed communication networks</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">MEMS switches are considered as a promising element base of microwave electronics, but their performance has not reached the required level yet. The ratio of capacitances in the closed and open states does not exceed 10 and has to be increased. A possible method is to apply an intermediate electrode over the dielectric coating of a transmission line. In this&#13;
work, a MEMS switch with an intermediate electrode is proposed for use in 5G communication networks.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.135</doi>
          <udk>621.3</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>MEMS switch</keyword>
            <keyword>intermediate electrode</keyword>
            <keyword>capacitance ratio</keyword>
            <keyword>isolation</keyword>
            <keyword>insertion loss</keyword>
            <keyword>finite element method</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.35/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>182-186</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0001-6869-1213</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Vyacheslavova</surname>
              <initials>Ekaterina</initials>
              <email>cate.viacheslavova@yandex.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Mokhov</surname>
              <initials>Dmitry</initials>
              <email>mokhov@spbau.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-0061-6687</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Uvarov</surname>
              <initials>Alexander</initials>
              <email>lumenlight@mail.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0002-3503-7458</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>St. Petersburg Electrotechnical University "LETI"</orgName>
              <surname>Maksimova</surname>
              <initials>Alina A.</initials>
              <email>deer.blackgreen@yandex.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0005-6836-4091</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Mikhaylov </surname>
              <initials>Oleg </initials>
              <email>oleg.mikhaylov.00@gmail.com</email>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0002-4894-6503</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Baranov</surname>
              <initials>Artem I.</initials>
              <email>baranov_art@spbau.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <orcid>0000-0002-7632-3194</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Gudovskikh</surname>
              <initials>Alexander</initials>
              <email>gudovskikh@spbau.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Black silicon formation using cryogenic etching and photoresist layer</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">A series of experiments were conducted to develop the plasma etching of black silicon through a layer of polydimethylglutarimide (PMGI) photoresist. The silicon wafers were previously subjected to wet-chemical treatment. A ~25 nm thick photoresist layer facilitates the process of creating regular black silicon structures on substrates with a diameter of 100 mm. The etching process was varied in terms of the sulfur hexafluoride (SF6) and oxygen (O2) gas mixture ratio, RF power applied to the substrate holder (bias power), inductively coupled plasma (ICP) power and chamber pressure. Increasing the bias power from 10 to 30 W under otherwise constant conditions enhances the etching rate. Reducing the pressure in the reactor from 10 to 5 mTorr at a constant gas flow rate leading to a higher etching rate. Increasing the proportion of oxygen in the SF6/O2 gas mixture (2:1) enhances passivation, reducing the black silicon structures size.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.136</doi>
          <udk>621.383.51</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>black silicon</keyword>
            <keyword>PMGI photoresist</keyword>
            <keyword>cryogenic etching</keyword>
            <keyword>solar cell</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.36/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>187-190</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Shepeleva</surname>
              <initials>Anastasia</initials>
              <email>eduard.shepelev.67@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-9602-7221</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Research Institute of Electronic and Mechanical Devices</orgName>
              <surname>Gurin</surname>
              <initials>Sergey</initials>
              <address>Penza, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0001-9319-2475</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Research Institute of Electronic and Mechanical Devices</orgName>
              <surname>Novichkov </surname>
              <initials>Maksim </initials>
              <address>Penza, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0009-0009-4548-3724</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Agafonov </surname>
              <initials>Dmitriy </initials>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Pecherskaya</surname>
              <initials>Ekaterina</initials>
              <email>pea1@list.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0009-0005-5656-4918</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Research Institute of Electronic and Mechanical Devices</orgName>
              <surname>Zuev</surname>
              <initials>Vyacheslav</initials>
              <address>Penza, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Technological process of manufacturing a gas-sensitive multisensor chip based on a passivating coating of zinc oxide nanorods obtained by thin-film technology</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">A method for manufacturing a gas-analytical multisensor chip is presented. The technological process of manufacturing with an additional SiO2 layer is described. It was found&#13;
that the design of the experimental sample of the multisensor chip and the technology of synthesis of low-dimensional gas-sensitive layers provide sensitivity to detected gases up to 1 ppm and allow to increase the speed and temporal stability.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.137</doi>
          <udk>621.794.47</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>gas-sensitive layer</keyword>
            <keyword>dopant</keyword>
            <keyword>response time</keyword>
            <keyword>recovery time</keyword>
            <keyword>technological process</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.37/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>191-194</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0000-3147-6974</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University of RAS</orgName>
              <surname>Funtikova</surname>
              <initials>Anastasiia</initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0002-8661-4083</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Mozharov</surname>
              <initials>Alexey</initials>
              <email>mozharov@spbau.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Sharov</surname>
              <initials>Vladislav</initials>
              <email>vl_sharov@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0001-8440-494X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Novikova</surname>
              <initials>Kristina</initials>
              <email>novikova_k@spbau.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0000-0002-4172-940X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Dvoretckaia </surname>
              <initials>Liliya</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Investigation of second harmonic generation in spherical mesoporous Si/SiO2 nanoparticles on gold</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In this work, experimental and numerical investigation of second harmonic generation (SHG) in mesoporous Si/SiO2 nanoparticles has been performed. Experimental results are well-described by simulations. Spectral analysis reveals that SHG efficiency maxima correlate with Mie resonances of Si/SiO2 nanoparticles. Tuning the diameter of the structures the maximum SHG efficiency for required wavelength can be achieved. The nonlinear optical susceptibility of the studied nanoparticles attains values on the order of 1.59×10−14 m2/V, which exceeds that of bulk silicon. Spherical mesoporous Si/SiO2 nanoparticles demonstrate effective second harmonic generation with simple, low-cost fabrication, making them promising candidates as tunable frequency converters for integrated nanophotonic circuits.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.138</doi>
          <udk>535.015</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>second harmonic generation</keyword>
            <keyword>silicon</keyword>
            <keyword>spherical nanoparticles</keyword>
            <keyword>Mie resonances</keyword>
            <keyword>gold</keyword>
            <keyword>mesoporous</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.38/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>195-198</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0001-8930-5438</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Lavrinenko </surname>
              <initials>Valeriy </initials>
              <email>Lavrinenko_valerav@inbox.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Vasilieva</surname>
              <initials>Anastasia</initials>
              <email>anastasiastru@mail.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Parfenov</surname>
              <initials>Vadim</initials>
              <email>vadim_parfenov@mail.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Laser polishing of steel surface for microfluidic applications</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The paper examines various modes of laser polishing of stainless steel surface to decrease a surface roughness for creating model micro-grooves corresponding to the elements of the microfluidic topology. The effect of the formation of an oxide film and its effect on the roughness of the treated area is considered as well. The data obtained is confirmed by measurements using a profilometer.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.139</doi>
          <udk>53.06</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>microfluidics</keyword>
            <keyword>laser processing</keyword>
            <keyword>laser polishing</keyword>
            <keyword>steel</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.39/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>199-203</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-6222-5526</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Verkhogliadov </surname>
              <initials>Grigorii </initials>
              <email>g.verkhogliadov@skoltech.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0002-0616-2524</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Marunchenko</surname>
              <initials>Alexandr</initials>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Sapozhnikova</surname>
              <initials>Elizaveta</initials>
              <email>e.sapozhnikova@metalab.ifmo.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0003-2283-3495</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kushchenko</surname>
              <initials>Olga</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0000-0003-2423-7945</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Sinelnik</surname>
              <initials>Artem</initials>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0002-1793-6812</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Pushkarev</surname>
              <initials>Anatoly</initials>
              <email>anatoly.pushkarev@metalab.ifmo.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Perovskite-GST hybrid platform for optical memristors with complex optical response</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">This study explores the optical properties of a perovskite-GST hybrid platform, revealing a remarkable, up to twofold, increasing of photoluminescence intensity of halide perovskite&#13;
thin film by switching the phase of GST substrate from amorphous to crystalline. The underlying mechanisms responsible for this strong modulation in photoluminescence intensity&#13;
are related to interaction between the halide perovskite and the GST substrate, which we are investigating through comprehensive morphological and optical characterization techniques, highlighting the different reflectance properties of the crystalline and amorphous phases of GST. We consider this hybrid platform as a promising architecture for a neuromorphic system, leveraging the volatile properties of halide perovskites with the non-volatile characteristics of GST. This architecture aims to mimic the functionalities of the human brain, including the behavior of neurons and synapses, thus opening new avenues for the development of energy-efficient and highly adaptive computing systems. Our findings contribute to a deeper understanding of hybrid perovskite-GST platform and its potential in future technological applications in neuromorphic systems.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.140</doi>
          <udk>628.9.037</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>halide perovskite</keyword>
            <keyword>phase-change materials</keyword>
            <keyword>volatile memory</keyword>
            <keyword>nonvolatile memory</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.40/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>204-208</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Kalantaevskii </surname>
              <initials>Ivan</initials>
              <email>royal37lol@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Gorelkina</surname>
              <initials>Tatiana</initials>
              <email>tatiana.gorelkina@metalab.ifmo.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Gasnikova</surname>
              <initials>Ksenia</initials>
              <email>k.gasnikova@metalab.ifmo.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0002-9026-6106</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Glebov</surname>
              <initials>Nikita</initials>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <orgName>Moscow Institute of Physics and Technology (MIPT)</orgName>
              <surname>Chernov</surname>
              <initials>Alexander</initials>
              <email>a.chernov@rqc.ru</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0002-8143-4606</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Alekseev</surname>
              <initials>Prokhor</initials>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <orgName>ITMO University</orgName>
              <surname>Kravtsov</surname>
              <initials>Vasily</initials>
              <email>vasily.kravtsov@metalab.ifmo.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Mechanical scanning probe lithography of van der Waals antiferromagnetic CrSBr for fabrication of high-index waveguides and resonators</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Recently emerged van der Waals antiferromagnetic CrSBr provides new opportunities for developing compact integrated photonic and optoelectronic devices since it exhibits high refractive index, strong excitonic response, and magnetic ordering. However, experimental methods for nanostructuring CrSBr to tailor its photonic properties are not yet well developed. Here we demonstrate photonic dispersion engineering in subwavelength-thick CrSBr slabs through patterning and creating slab photonic crystal structures. Using mechanical scanning probe lithography − a non-destructive technique benefiting from piezostage precision − we fabricate nanostructured CrSBr flakes of controlled geometry. Back-focal-plane reflectance spectroscopy measurements reveal modified photonic dispersion characteristics, with the photonic crystal dispersion tuned close to the CrSBr exciton resonance. The demonstrated engineering of the photonic dispersion in CrSBr, with tunable alignment between the photonic crystal resonance and the exciton energy, provides a base for further studies of exciton-photon interaction in 2D magnetic materials.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.141</doi>
          <udk>535.016</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>scanning probe lithography</keyword>
            <keyword>van der Waals magnetics</keyword>
            <keyword>photonic crystal slab</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.41/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>209-213</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-7025-3527</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>National Research University “Higher School of Economics”</orgName>
              <surname>Komarov</surname>
              <initials>Sergey</initials>
              <email>serega.komarow@mail.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Vainilovich</surname>
              <initials>Alexey</initials>
              <email>a.vainilovich@ifanbel.bas-net.by</email>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0009-0007-9304-6401</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Grigorii</surname>
              <initials>Grigorii </initials>
              <email>gafeygin@edu.hse.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Sakharov</surname>
              <initials>Alexey</initials>
              <email>val@beam.ioffe.rssi.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Nikolaev</surname>
              <initials>Andrei</initials>
              <email>Aen@mail.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Ivanov</surname>
              <initials>Konstantin </initials>
              <email>kivanov@hse.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <orcid>0000-0003-3686-935X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>National Research University “Higher School of Economics” (St. Petersburg branch)</orgName>
              <surname>Moiseev</surname>
              <initials>Eduard</initials>
              <email>emoiseev@hse.ru</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Kryzhanovskaya Natalia V.</surname>
              <initials>Natalia</initials>
              <email>nkryzhanovskaya@hse.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <surname>Nikitina</surname>
              <initials>Ekaterina </initials>
              <email>mail.nikitina@mail.ru</email>
            </individInfo>
          </author>
          <author num="010">
            <individInfo lang="ENG">
              <surname>Tsatsulnikov</surname>
              <initials>Andrey</initials>
              <email>andrew@beam.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="011">
            <individInfo lang="ENG">
              <surname>Lutsenko</surname>
              <initials>Eugeniy</initials>
              <email>e.lutsenko@ifanbel.bas-net.by</email>
            </individInfo>
          </author>
          <author num="012">
            <authorCodes>
              <scopusid>35379962200</scopusid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Ioffe Physical Technical Institute of the Russian Academy of Sciences</orgName>
              <surname>Zhukov</surname>
              <initials>Alexey</initials>
              <email>zhukov@beam.ioffe.ru</email>
              <address>Russia, 194021, St.Petersburg, Polytechnicheskaya 26</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Optical properties of disk microresonators based on wide-bandgap III-N materials</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Fabrication, optical study, and mode modeling of III-N microdisk resonators with InGaN/GaN quantum wells on Al2O3 are presented. It is shown that the created epitaxial structures have high optical quality, and the microresonators support high-Q whispering gallery modes.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.142</doi>
          <udk>535.37:621.315.592</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>III-N</keyword>
            <keyword>WGM microresonators</keyword>
            <keyword>InGaN/GaN quantum wells</keyword>
            <keyword>microdisk lasers</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.42/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>214-221</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Arinushkina </surname>
              <initials>Kseniya </initials>
              <email>k-arinushkina@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0002-7511-7740</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Savelev</surname>
              <initials>Igor</initials>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Davydov</surname>
              <initials>Vadim</initials>
              <email>davydov_vadim66@mail.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0002-9520-4596</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Adadurov</surname>
              <initials>Aleksandr</initials>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0002-4609-1692</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Tsomaev</surname>
              <initials>Pavel</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Profile construction and determination of geometric parameters of the rolling surface of a railway wheel using a laser profilometer</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The problems arising in the processing of optical images formed from laser signals reflected from the surface of a railway wheel are considered. A design has been developed for the placement of laser emitters and photodetector devices for examining railway wheels in motion. A new algorithm has been developed aimed at improving the accuracy of constructing the profile of the rolling surface of the wheel. To process the recorded optical images in the laser radiation reflected from the surface of the wheel, a new technique based on the use of data filtering has been proposed, which uses a new algorithm that allows removing glare (a cloud of points with false data), outliers (single false points) and leaving only the necessary profile points. The new algorithm is based on the HDBSCAN (Hierarchical Density-Based Spatial Clustering of Applications with Noise) clustering algorithm. The algorithm makes it possible to exclude points forming errors during the construction of the profile of the rolling surface of the wheel. The use of a new design for the placement of optical elements and an algorithm made it possible to increase the accuracy of measurements of key wheel parameters, such as thickness, height and steepness of the ridge, and uniform rolling.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.143</doi>
          <udk>620.1.08, 681.786.5, 681.7.014.3</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>laser radiation</keyword>
            <keyword>reflected signal</keyword>
            <keyword>optical image</keyword>
            <keyword>matrix photodetector</keyword>
            <keyword>wheel pair profile</keyword>
            <keyword>surface</keyword>
            <keyword>defects</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.43/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>222-225</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0003-2282-3895</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Savelyev Dmitry</surname>
              <initials>Dmitry</initials>
              <email>dmitrey.savelyev@yandex.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">The investigation of Laguerre–Gaussian (0,1) mode focusing in the near-field diffraction by subwavelength variable-height ring gratings</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The parameters of the height of individual zones of subwave ring gratings were established in this paper for which the formation of a long light needle (7.85 wavelengths) is observed in the near diffraction zone with azimuthal polarization of laser radiation. The possibility of reducing the focal spot size to 0.31 wavelengths with circular polarization of the Laguerre–Gauss mode (0,1) was also shown.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.144</doi>
          <udk>535.42</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>Laguerre–Gaussian mode</keyword>
            <keyword>optical needle</keyword>
            <keyword>FDTD</keyword>
            <keyword>subwavelength ring gratings</keyword>
            <keyword>polarization</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.44/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>226-231</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Neelova </surname>
              <initials>Angelina </initials>
              <email>angelina.neelova@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Parfenov</surname>
              <initials>Vadim</initials>
              <email>vadim_parfenov@mail.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Laser cleaning of organic pigments on paper</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">This paper is devoted to the investigation of laser cleaning of organic pigments on paper. In recent years, laser technologies have been widely used in the preservation of Cultural Heritage (CH). One of the main fields of laser application in this area is the cleaning of CH objects from various contaminations of natural or anthropogenic origin. Experimental results&#13;
of laser cleaning with the Ytterbium pulsed fibre laser (1064 nm wavelength) of model samples of modern organic pigments on paper as well as Raman spectroscopy analysis of the obtained results are presented.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.145</doi>
          <udk>544.032.65</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>cultural heritage</keyword>
            <keyword>laser cleaning</keyword>
            <keyword>pigments</keyword>
            <keyword>contaminations</keyword>
            <keyword>fibre laser</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.45/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>232-236</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0000-7489-4391</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kostina </surname>
              <initials>Dina </initials>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Malo  </surname>
              <initials>Dana</initials>
              <email>malo.dana@mail.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <orgName>Moscow Institute of Physics and Technology (National Research University)</orgName>
              <surname>Lizunova</surname>
              <initials>Anna</initials>
              <email>anna.lizunova@gmail.com</email>
              <address>Dolgoprudny, Moscow region, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>Moscow Institute of Physics and Technology (National Research University)</orgName>
              <surname>Kameneva</surname>
              <initials>Ekaterina</initials>
              <email>kameneva.ei@phystech.edu</email>
              <address>Dolgoprudny, Moscow region, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Optical properties of aluminum nanostructures modified by polymer coatings</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In this research, optical properties of Al films based on Al nanoparticles (Al NPs) with a particle size of 55 nm were studied by analyzing the absorption spectra before and after deposition of polymer coatings. Plasmonic Al nanostructures films were fabricated using spin-coating on quartz substrates, followed by sequential deposition of polymer using poly-&#13;
L-lysine (PLL) and dextran. The obtained results showed that dextran coating did not induce significant spectral changes, whereas PLL provided a shift in the absorption resonance peak of Al films from 230 nm to 300 nm. Additionally, at an excitation wavelength of 325 nm, the photoluminescence enhancement of ZnO nanocrystals with 27 nm in particle size was investigated in the presence of Al nanostructures with and without PLL film as intermediate film. The results demonstrated that the increase in photoluminescence enhancement factor at an emission wavelength of 377 nm in the presence of PLL film between ZnO and Al films up to 68%. These findings proved that polymer coatings have a significant impact on the optical response of aluminum nanostructures. The obtained results provide a promising methodology for tuning their optical properties and plasmon-enhanced photoluminescence factor for many plasmonic and biosensing applications in the ultraviolet region.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.146</doi>
          <udk>544.7</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>aluminum nanoparticles</keyword>
            <keyword>poly-L-lysine</keyword>
            <keyword>dextran</keyword>
            <keyword>zinc oxide nanoparticles</keyword>
            <keyword>plasmon resonance</keyword>
            <keyword>plasmon-enhanced photoluminescence</keyword>
            <keyword>ultraviolet</keyword>
            <keyword>spin-coating</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.46/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>237-241</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Melnichenko</surname>
              <initials>Ivan</initials>
              <email>imelnichenko@hse.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0002-4110-1647</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Shugabaev</surname>
              <initials>Talgat</initials>
              <email>talgashugabaev@mail.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Gridchin </surname>
              <initials>Vladislav</initials>
              <email>gridchinvo@gmail.com</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Kryzhanovskaya Natalia V.</surname>
              <initials>Natalia</initials>
              <email>nkryzhanovskaya@hse.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Balakirev</surname>
              <initials>Sergey</initials>
              <email>sbalakirev@sfedu.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Solodovnik</surname>
              <initials>Maxim</initials>
              <email>solodovnikms@sfedu.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <scopusid>35379962200</scopusid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Ioffe Physical Technical Institute of the Russian Academy of Sciences</orgName>
              <surname>Zhukov</surname>
              <initials>Alexey</initials>
              <email>zhukov@beam.ioffe.ru</email>
              <address>Russia, 194021, St.Petersburg, Polytechnicheskaya 26</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Optical studies of InGaAs/GaAs quantum well mesa structures passivated with sol-gel SiO2</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">A remarkable increase in photoluminescence intensity for passivated mesa structures with InGaAs/GaAs quantum wells were demonstrated using the method of sol-gel SiO2 passivation. The photoluminescence signal enhancement up to 50 times for 1.25 μm diameter mesas after passivation was observed. The obtained results are promising for use in microlasers with active region based on InGaAs quantum wells.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.147</doi>
          <udk>621.382.3</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>sol-gel passivation</keyword>
            <keyword>InGaAs quantum well</keyword>
            <keyword>photoluminescence</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.47/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>242-246</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0002-8847-2442 </orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Tiushkevich </surname>
              <initials>Andrei </initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0009-0005-9354-4297</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Pleshakov</surname>
              <initials>Pavel</initials>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0003-0111-6542</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Filatov</surname>
              <initials>Nikita</initials>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Bukatin</surname>
              <initials>Anton</initials>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Development of heterogeneous bioinks with microgels for creating 3D tissue engineering models for drug screening</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">To achieve clinical relevance, tissue-engineered constructs should replicate the metabolic activity and vasculature of native tissues and organs. Currently, conventional bioinks struggle to mimic the structural complexity of human tissues. Adding microgels with living cells into bioinks enables precise control over structural and functional complexity, offering a scalable&#13;
platform for regenerative therapies and drug testing. The study introduces a heterogeneous bioink with microgels designed to bioprint tissue engineering constructs with complex architecture. To do this, we optimized the 1.5 % wt. alginate bioink composition adding Pluronic F-127 10 % wt. together with 3.75 % wt. gelatin microgels, fabricated via droplet microfluidics. An extrusion bioprinter was used to print test structures using this compound. As a result, it was possible to outline the first steps toward an effective protocol for creating tissue-engineered constructs from the multicomponent hydrogel solution with CT-26 eGFP cell viability up to 95% for the 10th cultivation day.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.148</doi>
          <udk>57.085.23</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>tissue engineering</keyword>
            <keyword>hydrogel microparticles</keyword>
            <keyword>microgels</keyword>
            <keyword>droplet microfluidics</keyword>
            <keyword>3D bioprinting</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.48/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>247-251</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-0061-6687</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Uvarov</surname>
              <initials>Alexander</initials>
              <email>lumenlight@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0002-4894-6503</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Baranov</surname>
              <initials>Artem I.</initials>
              <email>baranov_art@spbau.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-3503-7458</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>St. Petersburg Electrotechnical University "LETI"</orgName>
              <surname>Maksimova</surname>
              <initials>Alina A.</initials>
              <email>deer.blackgreen@yandex.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0001-6869-1213</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Vyacheslavova</surname>
              <initials>Ekaterina</initials>
              <email>cate.viacheslavova@yandex.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0009-0009-4023-6185</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Pozdeev </surname>
              <initials>Vyacheslav </initials>
              <email>pozdeev99va@gmail.com</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0009-0005-6836-4091</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Mikhaylov </surname>
              <initials>Oleg </initials>
              <email>oleg.mikhaylov.00@gmail.com</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Nikitina</surname>
              <initials>Ekaterina </initials>
              <email>mail.nikitina@mail.ru</email>
            </individInfo>
          </author>
          <author num="008">
            <authorCodes>
              <orcid>0000-0002-7632-3194</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Gudovskikh</surname>
              <initials>Alexander</initials>
              <email>gudovskikh@spbau.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Structural and optical properties of InP layers obtained by plasma-enhanced atomic layer deposition at different temperatures</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Plasma-enhanced atomic layer deposition (PE-ALD) was employed to deposit indium phosphide (InP) thin films on silicon substrates at temperatures ranging from 250 °C to 380 °C. Using trimethylindium and phosphine as precursors, the influence of deposition temperature on film growth rate, structural, and optical properties was investigated. A stable growth&#13;
per cycle (GPC) was observed within the 250–350 °C range, indicating self-limiting ALD behavior, while an increase in GPC at 380 °C suggested onset of non-ideal growth mechanisms.&#13;
Raman spectroscopy revealed improved crystallinity with increasing temperature, demonstrated by intensified longitudinal optical phonon peaks. Photoluminescence measurements showed near-band-edge emission around 1.36–1.39 eV, with a blue shift and narrowing of the emission peak at higher temperatures, indicating enhanced optical quality and reduced defect density.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.149</doi>
          <udk>538.975</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>indium phosphide</keyword>
            <keyword>atomic layer deposition</keyword>
            <keyword>plasma</keyword>
            <keyword>silicon</keyword>
            <keyword>raman spectroscopy</keyword>
            <keyword>photoluminescence</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.49/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>252-257</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Eurov </surname>
              <initials>Daniil </initials>
              <email>edan@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0003-2956-6561</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Golubev</surname>
              <initials>Valery</initials>
              <email>golubev@gvg.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Grudinkin</surname>
              <initials>Sergey</initials>
              <email>grudink@gvg.ioffe.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Kurdyukov</surname>
              <initials>Dmitry</initials>
              <email>kurd@gvg.ioffe.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0000-0002-1571-209X</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>ITMO University</orgName>
              <surname>Kirilenko</surname>
              <initials>Demid</initials>
              <email>demid.kirilenko@mail.ioffe.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0003-0651-6860</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Yakovleva</surname>
              <initials>Anastasiia </initials>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Stovpiaga </surname>
              <initials>Ekaterina </initials>
              <email>kattrof@gvg.ioffe.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Morphological features of CVD-grown Si nanostructures in meso- and macroporous silicas</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Morphology of silicon nanostructures obtained by thermal chemical vapour deposition (CVD) method in mesoporous silica particles (mSiO2) and macroporous synthetic opal were studied. The proposed method allows obtaining a uniform Si layer on the surface of non-porous spherical silica particles forming macropores in opal, in contrary, to complete filling of 3-nm pores inside mesoporous particles with amorphous silicon. The thermal CVD provides for gradual change of pore filling which, in turn, leads to step-to-step variation of porosity characteristics in the case of mSiO2/Si and the modification of photonic crystal properties in the case of opal-Si.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.150</doi>
          <udk>54.057</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>spherical particles</keyword>
            <keyword>silicon</keyword>
            <keyword>nanostructures</keyword>
            <keyword>silica</keyword>
            <keyword>mesopores</keyword>
            <keyword>opal</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.50/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>258-262</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0005-6836-4091</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Mikhaylov </surname>
              <initials>Oleg </initials>
              <email>oleg.mikhaylov.00@gmail.com</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0002-4894-6503</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Baranov</surname>
              <initials>Artem I.</initials>
              <email>baranov_art@spbau.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0009-0009-4023-6185</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Pozdeev </surname>
              <initials>Vyacheslav </initials>
              <email>pozdeev99va@gmail.com</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0002-0061-6687</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Uvarov</surname>
              <initials>Alexander</initials>
              <email>lumenlight@mail.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0000-0002-3503-7458</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>St. Petersburg Electrotechnical University "LETI"</orgName>
              <surname>Maksimova</surname>
              <initials>Alina A.</initials>
              <email>deer.blackgreen@yandex.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0001-6869-1213</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Vyacheslavova</surname>
              <initials>Ekaterina</initials>
              <email>cate.viacheslavova@yandex.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <orcid>0000-0002-7632-3194</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Gudovskikh</surname>
              <initials>Alexander</initials>
              <email>gudovskikh@spbau.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Capacitance characterization of GaN/InP multilayer structures</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">This study investigates defect states in GaN/InP multilayer structures fabricated using plasma-enhanced atomic layer deposition (PEALD) for potential applications in high-efficiency multijunction solar cells. Deep-level transient spectroscopy (DLTS) and admittance spectroscopy were employed to characterize defects in the heterostructures. The DLTS spectra&#13;
revealed a distinct peak in the temperature range of 230−300 K, corresponding to defect states with activation energies of 0.46−0.58 eV under various bias voltages (from 0 to +2 V and from −1 to 0 V). Admittance spectroscopy confirmed the presence of similar defects, demonstrating voltage-dependent activation energies in the range of 0.36−0.57 eV, which is likely associated with interface states at the GaN/InP interface.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.151</doi>
          <udk>621.315.592</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>multilayer structures</keyword>
            <keyword>defects</keyword>
            <keyword>admittance spectroscopy</keyword>
            <keyword>DLTS</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.51/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>263-267</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-6222-5526</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Verkhogliadov </surname>
              <initials>Grigorii </initials>
              <email>g.verkhogliadov@skoltech.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Ekgardt </surname>
              <initials>Alexey</initials>
              <email>aleksei.ekgardt@metalab.ifmo.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Semyonov</surname>
              <initials>Dmitrii</initials>
              <email>dmitrii.semenov@metalab.ifmo.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0003-4552-3991</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Anoshkin</surname>
              <initials>Sergey</initials>
              <email>sergey.anoshkin@metalab.ifmo.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Ratmanova</surname>
              <initials>Nina</initials>
              <email>nina.ratmanova@fccho-moscow.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0000-0002-1793-6812</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Pushkarev</surname>
              <initials>Anatoly</initials>
              <email>anatoly.pushkarev@metalab.ifmo.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Phase control of quasi-2D halide perovskite by post-treatment and antisolvent treatment techniques</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The fabrication of efficient and stable deep blue halide perovskite light-emitting diodes has attracted significant interest nowadays due to their potential applications in next-generation display technologies. Quasi-2D halide perovskite seems to be perfect material for this application, owing to their unique optoelectronic properties and tunability. However,&#13;
during the deposition from stoichiometrically clear phase solution mixture of phases is forming in the thin film leading to redshift of luminescence peak. This shift occurs due to energy&#13;
transfer between different phases, affecting the performance and stability of the light-emitting diode. In this study, we explore various approaches for phase control in multiple quantum well structures to achieve stable and efficient emission in the blue region. Additionally, we conduct a comparative analysis of two distinct quasi-2D ligands used in the synthesis of these materials, evaluating their influence on the optical and electronic properties. We study possible ways for synthesis of pure phase quasi-2D perovskite thin films for their implementation in light-emitting diodes.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.152</doi>
          <udk>539.216.2</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>quasi-2D halide perovskite</keyword>
            <keyword>phase control</keyword>
            <keyword>photoluminescence</keyword>
            <keyword>absorption spectroscopy</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.52/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>268-272</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Voronin</surname>
              <initials>Anton</initials>
              <email>a.voronin1988@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <orgName>Bauman Moscow State Technical University</orgName>
              <surname>Makeev</surname>
              <initials>Mstislav</initials>
              <email>m.makeev@bmstu.ru</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Parshin </surname>
              <initials>Bogdan </initials>
              <email>parshbgal@bmstu.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Khartov</surname>
              <initials>Stanislav</initials>
              <email>khartov.sv@ksc.krasn.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Optical and radio-frequency properties of silver mesh transparent conductor with irregular structure</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The article presents the results of studying the optical and radio-frequency properties of silver irregular mesh transparent conductors obtained using an original self-organized template. It is shown that variation in the thickness of the deposited silver allows easy control of the surface resistance, which is the determining factor affecting the transmission in the radio-frequency range. In particular, we have obtained an irregular silver mesh, which has a surface resistance of 1.44 Ω/sq with an optical transparency in the visible range of about&#13;
~81%. This combination of optoelectric parameters made it possible to achieve an extremely low transmittance in the range of 0.7−14 GHz, an average of −37.34 dB over the range, which means that this mesh blocks 99.9815% of radiowave.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.153</doi>
          <udk>537.874.76; 621.391.8</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>cracked template</keyword>
            <keyword>transparent conductor</keyword>
            <keyword>irregular mesh</keyword>
            <keyword>shielding efficiency</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.53/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>273-277</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Parshin </surname>
              <initials>Bogdan </initials>
              <email>parshbgal@bmstu.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Voronin</surname>
              <initials>Anton</initials>
              <email>a.voronin1988@mail.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Makarova</surname>
              <initials>Kamila</initials>
              <email>mkt@bmstu.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>Bauman Moscow State Technical University</orgName>
              <surname>Makeev</surname>
              <initials>Mstislav</initials>
              <email>m.makeev@bmstu.ru</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Butina</surname>
              <initials>Maria</initials>
              <email>masha.butina.54@mail.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Fadeev</surname>
              <initials>Yuriy</initials>
              <email>daf.hf@list.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <orcid>0000-0003-0672-4627</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Mikhalev</surname>
              <initials>Pavel</initials>
              <email>pamikhalev@bmstu.ru</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Hydyrova</surname>
              <initials>Selbi</initials>
              <email>hydyrova.selbi@ya.ru</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <surname>Moiseev</surname>
              <initials>Konstantin</initials>
              <email>k.moiseev@bmstu.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">ITO films as a functional material for THz radiation modulation</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In this paper, we investigate the terahertz (THz) transmittance and band gap (BG) properties of magnetron sputtered indium tin oxide (ITO) thin films. The THz transmittance was measured using THz time domain spectroscopy, which provides insight into the interaction of terahertz radiation and free carriers inside the films. The band gap was determined from&#13;
spectrophotometric data using Tauc diagrams, which allowed the analysis of both direct and indirect electron transitions. The results showed that the THz transmittance decreases with increasing film thickness, primarily due to the increase in free carrier absorption associated with higher conductivity and carrier concentration in thicker films. The observed optical band gap values depend on the Burstein–Moss effect caused by the filling of low-energy states in the conduction band with free electrons. The obtained results demonstrate a close relationship between the electronic structure and terahertz response in ITO films, confirming their potential for efficient control of terahertz radiation and application in optoelectronic devices.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.154</doi>
          <udk>53.082.534, 539.23</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>indium tin oxide</keyword>
            <keyword>Terahertz transmittance</keyword>
            <keyword>band gap</keyword>
            <keyword>THz time-domain spectroscopy</keyword>
            <keyword>spectrophotometry</keyword>
            <keyword>Tauc plots</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.54/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>278-282</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-4110-1647</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Shugabaev</surname>
              <initials>Talgat</initials>
              <email>talgashugabaev@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Kharchenko </surname>
              <initials>Anton </initials>
              <email>antoshkerrr@gmail.com</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <authorCodes>
              <orcid>0000-0002-0374-7033</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Dautov</surname>
              <initials>Albert</initials>
            </individInfo>
          </author>
          <author num="004">
            <authorCodes>
              <orcid>0000-0001-7143-6686</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Kusnetsov</surname>
              <initials>Alexey</initials>
              <email>alkuznetsov1998@gmail.com</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Lendyashova </surname>
              <initials>Vera </initials>
              <email>erilerican@gmail.com</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Kryzhanovskaya Natalia V.</surname>
              <initials>Natalia</initials>
              <email>nkryzhanovskaya@hse.ru</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <surname>Reznik</surname>
              <initials>Rodion </initials>
              <email>moment92@mail.ru</email>
            </individInfo>
          </author>
          <author num="008">
            <individInfo lang="ENG">
              <surname>Gridchin </surname>
              <initials>Vladislav</initials>
              <email>gridchinvo@gmail.com</email>
            </individInfo>
          </author>
          <author num="009">
            <individInfo lang="ENG">
              <surname>Cirlin</surname>
              <initials>George </initials>
              <email>george.cirlin@mail.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Optical characterization and surface plasmon polariton mode simulation of GaN/InGaN nanowires on Ag/AlOx film for plasmonic nanolasers</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Plasmonic nanolasers based on semiconductor nanowires are presently attracting wide interest due to the breaking in the light diffraction limit and the deep subwavelength mode operation. In this work, we synthesize and investigate the optical properties of GaN nanowires with InGaN quantum wells as the core element of plasmonic nanolasers. The results of&#13;
modeling the electric field intensity distribution for propagating modes and dispersion curve of surface plasmon polaritons in the studied nanowires placed on the AlOх-coated atomically flat Ag film confirm the formation of hybrid plasmonic modes and the viability of these structures for subwavelength light confinement and nanolaser applications.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.155</doi>
          <udk>535.3</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>InGaN</keyword>
            <keyword>GaN</keyword>
            <keyword>nanowires</keyword>
            <keyword>nanoplasmonics</keyword>
            <keyword>nanolasers</keyword>
            <keyword>molecular beam epitaxy</keyword>
            <keyword>photoluminescence</keyword>
            <keyword>numerical simulations</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.55/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>283-286</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-0374-7033</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Dautov</surname>
              <initials>Albert</initials>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-5547-9387</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Alferov University</orgName>
              <surname>Fedorov</surname>
              <initials>Vladimir</initials>
              <email>fedorov_vv@spbstu.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Kotlyar</surname>
              <initials>Konstantin</initials>
              <email>konstantin21kt@gmail.com</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Lendyashova </surname>
              <initials>Vera </initials>
              <email>erilerican@gmail.com</email>
            </individInfo>
          </author>
          <author num="005">
            <authorCodes>
              <orcid>0000-0002-4110-1647</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Shugabaev</surname>
              <initials>Talgat</initials>
              <email>talgashugabaev@mail.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Gridchin </surname>
              <initials>Vladislav</initials>
              <email>gridchinvo@gmail.com</email>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <orgName>St. Petersburg State University</orgName>
              <surname>Shtrom</surname>
              <initials>Igor</initials>
              <email>i.shtrom@spbu.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="008">
            <authorCodes>
              <orcid>0000-0002-7566-2522</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Sibirev</surname>
              <initials>Nikolai</initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Effect of short-term heating on the morphology of AlF3 microstructures</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">This work explores thermally modified AlF3 microstructures synthesized via aluminum-zinc reaction in hydrofluoric acid. Brief heating produces cushion-like morphologies, while room-temperature growths results in cracked crystals. The thermally treated samples exhibit anisotropic brittleness and easy delamination, suggesting weak interlayer bonding. SEM-EDS and XRD analyses reveal structure-property relationships, offering insights for tailored AlF3 microstructures in electronics and nanomaterials.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.156</doi>
          <udk>54.052</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>aluminum fluoride</keyword>
            <keyword>rosenbergit</keyword>
            <keyword>XRD analyze</keyword>
            <keyword>microstructures</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.56/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>287-292</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Volodina </surname>
              <initials>Daria </initials>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Eurov </surname>
              <initials>Daniil </initials>
              <email>edan@mail.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Balysh</surname>
              <initials>Zoya</initials>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <orgName>Ioffe Institute</orgName>
              <surname>Kurdyukov</surname>
              <initials>Dmitry</initials>
              <email>kurd@gvg.ioffe.ru</email>
              <address>St. Petersburg, Russian Federation</address>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Stovpiaga </surname>
              <initials>Ekaterina </initials>
              <email>kattrof@gvg.ioffe.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Control over the Stöber silica particles size within two orders of magnitude by tailoring the nucleation</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">A panoscopic approach for governing the size of Stöber silica particles over a wide length scale, from tens of nanometers to several microns has been suggested. Low-size particles&#13;
(10–400 nm) are obtained by changing the silica precursor, mid-size particles (0.4–0.7 mm) are synthesized with variation of ammonia concentration, large particles (up to 4 mm) are&#13;
made by successive growth method.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.157</doi>
          <udk>54.057</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>amorphous silica</keyword>
            <keyword>Stöber particles</keyword>
            <keyword>successive growth</keyword>
            <keyword>tetraethoxysilane</keyword>
            <keyword>3-methacryloxypropyltrimethoxysilane</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.57/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>293-297</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0001-9319-2475</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Research Institute of Electronic and Mechanical Devices</orgName>
              <surname>Novichkov </surname>
              <initials>Maksim </initials>
              <address>Penza, Russian Federation</address>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-9602-7221</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Research Institute of Electronic and Mechanical Devices</orgName>
              <surname>Gurin</surname>
              <initials>Sergey</initials>
              <address>Penza, Russian Federation</address>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Shepeleva</surname>
              <initials>Anastasia</initials>
              <email>eduard.shepelev.67@mail.ru</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Pecherskaya</surname>
              <initials>Ekaterina</initials>
              <email>pea1@list.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <orgName>Penza State University</orgName>
              <surname>Golubkov</surname>
              <initials>Pavel</initials>
              <email>golpavpnz@yandex.ru</email>
              <address>Penza, Russian Federation</address>
            </individInfo>
          </author>
          <author num="006">
            <authorCodes>
              <orcid>0009-0001-4255-1383</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <orgName>Penza State University</orgName>
              <surname>Maksov</surname>
              <initials>Andrey</initials>
              <address>Penza, Russian Federation</address>
            </individInfo>
          </author>
          <author num="007">
            <authorCodes>
              <orcid>0009-0009-4548-3724</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Agafonov </surname>
              <initials>Dmitriy </initials>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Effect of synthesis modes on the properties of microarc oxide coatings</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The article presents studies of the physical patterns of formation of oxide coatings on aluminum substrates by microarc oxidation. Correlation dependences of the influence of technological modes, such as current density and time, on the properties of microarc oxidation coatings have been established. A method for monitoring the quality parameters of formed oxide coatings in real time is proposed, based on the analysis of the deviation of the voltage–time curves from the traditional piecewise linear form. The results of the study can be used in the development of intelligent algorithms for creating a digital twin of the microarc oxidation process.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.158</doi>
          <udk>541.138</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>microarc oxidation</keyword>
            <keyword>oxide coating</keyword>
            <keyword>coating parameters</keyword>
            <keyword>controlled synthesis</keyword>
            <keyword>technological modes</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.58/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>298-301</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Zalessky</surname>
              <initials>Aleksandr</initials>
              <email>aleksandr.zalesskij@phystech.edu</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Osychenko </surname>
              <initials>Alina </initials>
              <email>alina.chemphys@gmail.com</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">The effect of femtosecond laser on DNA destruction assisted with SYTO fluorescent dye</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">Tightly-focused femtosecond laser radiation is widely used as a convenient tool for manipulating biological objects. The method of femtosecond laser surgery proved to be useful for the multiple applications, from eye correction to the subcellular structures destruction. Among other things, femtosecond laser surgery shown to be used as a tool for DNA destruction, which could be beneficial for assisted reproductive technologies in humans. In the context of the development of this method, the study of the DNA laser assisted destruction efficiency is of significant importance. In this work, DNA laser assisted destruction efficiency in presence of SYTO fluorescent dye was studied.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.159</doi>
          <udk>53.047</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>DNA damage</keyword>
            <keyword>femtosecond laser surgery</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.59/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>302-305</pages>
        <authors>
          <author num="001">
            <individInfo lang="ENG">
              <surname>Kurilova </surname>
              <initials>Uliana </initials>
              <email>kurilova_10@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Murashko</surname>
              <initials>Denis</initials>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Suchkova </surname>
              <initials>Victoria </initials>
              <email>molodykh1999@gmail.com</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Suetina</surname>
              <initials>Irina</initials>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Mezentseva</surname>
              <initials>Marina</initials>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Russu</surname>
              <initials>Leonid</initials>
            </individInfo>
          </author>
          <author num="007">
            <individInfo lang="ENG">
              <orgName>National Research University of Electronic Technology</orgName>
              <surname>Gerasimenko</surname>
              <initials>Alexander</initials>
              <email>gerasimenko@bms.zone</email>
              <address>Moscow, Russian Federation</address>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Nanomaterials based on carbon framework for cells stimulation</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The work is devoted to the technology of formation and study of physical and chemical characteristics and biocompatibility of nanomaterials based on hybrid structures of carbon nanotubes and reduced graphene oxide, obtained by spray deposition and laser processing with nanosecond pulsed laser of 1064 nm wavelength, for bioelectronics applications. The formation of a connected structure between the components was proved with scanning electron microscopy, the optimal power of laser processing was found as 0.07 W to obtain the largest number of connections between carbon nanotubes and reduced graphene oxide, thanks to which high electrical conductivity was achieved. The experiments on electrical stimulation in vitro were provided with the developed setup based on a culture plate, an impulse generator and electrodes connected to samples. Cells seeded on the obtained structures with electrical stimulation demonstrate better proliferation and monolayer forming compared to the control sample. Thus, the developed structures can be successfully used as part of various bioelectronic devices for improved tissue recovery using electrical stimulation.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.160</doi>
          <udk>544.032.65</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>carbon nanotubes</keyword>
            <keyword>reduced graphene oxide</keyword>
            <keyword>bioelectronics</keyword>
            <keyword>fibroblasts</keyword>
            <keyword>electrical stimulation</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.60/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>306-311</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0009-0004-8401-0181</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Popov </surname>
              <initials>Alexander </initials>
              <email>alexander_popov_work@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <individInfo lang="ENG">
              <surname>Davydov</surname>
              <initials>Vadim</initials>
              <email>davydov_vadim66@mail.ru</email>
            </individInfo>
          </author>
          <author num="003">
            <individInfo lang="ENG">
              <surname>Shavshin </surname>
              <initials>Artyom </initials>
              <email>shavshin2107@gmail.com</email>
            </individInfo>
          </author>
          <author num="004">
            <individInfo lang="ENG">
              <surname>Boldarev</surname>
              <initials>Dmitriy</initials>
              <email>boldarev2001@inbox.ru</email>
            </individInfo>
          </author>
          <author num="005">
            <individInfo lang="ENG">
              <surname>Klimenko </surname>
              <initials>Daria </initials>
              <email>dasha.klimenko.01@inbox.ru</email>
            </individInfo>
          </author>
          <author num="006">
            <individInfo lang="ENG">
              <surname>Dmitriev </surname>
              <initials>Roman </initials>
              <email>Rusher.official@gmail.com</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Development of an inter-satellite data transmission network for space debris evasion systems</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">The space debris problem was revealed. Research of space debris situation data from open sources of information such as European Space Agency was carried out. Methods of satellite protection were revealed. Collision avoidance system was proposed. It consists of satellites with a built-in location system and low speed mesh-network. Location satellites are used for long-range precise detection of objects with trajectories which are dangerous for protected spacecrafts, while the data is transmitted with CubeSat chain. The aim of this work is to develop an inter-satellite network for technical information exchange. As a result of the research, LoRa technology is selected because of low power consumption and significant coverage range of a single device. The network operation was simulated using MATLAB software and calculated results confirmed that the proposed method is adequate.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.161</doi>
          <udk>004.738.2.</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>inter-satellite network</keyword>
            <keyword>LoRa</keyword>
            <keyword>network simulation</keyword>
            <keyword>mesh network</keyword>
            <keyword>space debris</keyword>
            <keyword>collision avoidance</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.61/</furl>
          <file/>
        </files>
      </article>
      <article>
        <artType>CNF</artType>
        <langPubl>RUS</langPubl>
        <pages>312-316</pages>
        <authors>
          <author num="001">
            <authorCodes>
              <orcid>0000-0002-1098-0300</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Bagrov </surname>
              <initials>Alexander</initials>
              <email>alexander.bagrov00@mail.ru</email>
            </individInfo>
          </author>
          <author num="002">
            <authorCodes>
              <orcid>0000-0001-8682-4956</orcid>
            </authorCodes>
            <individInfo lang="ENG">
              <surname>Bashkirov</surname>
              <initials>Evgeniy</initials>
              <email>bash@ssau.ru</email>
            </individInfo>
          </author>
        </authors>
        <artTitles>
          <artTitle lang="ENG">Qubit-qubit entanglement in the Tavis–Cummings model with two independent resonators</artTitle>
        </artTitles>
        <abstracts>
          <abstract lang="ENG">In this paper, a three-qubit Tavis–Cummings model with two independent lossless single-mode resonators is considered. It is assumed that the initial states of the resonator fields are thermal fields and the qubits are in genuine entangled W- and GHZ-type states. For the model under study and the specified initial states of the resonator fields and qubits, we have exactly solved the quantum Liouville equation for the full density matrix. The full density matrix was used to calculate the entanglement parameters – negativity and fidelity. The computer simulation results showed that in the investigated model, the entanglement for all initial qubit states breaks down rapidly with increasing intensity of the thermal fields of the resonators compared to the previously investigated three-qubit models. Moreover, a sudden death of entanglement is observed even for vacuum resonator fields.</abstract>
        </abstracts>
        <codes>
          <doi>10.18721/JPM.183.162</doi>
          <udk>530.145.83</udk>
        </codes>
        <keywords>
          <kwdGroup lang="ENG">
            <keyword>independent resonators</keyword>
            <keyword>fidelity</keyword>
            <keyword>qubits</keyword>
            <keyword>negativity</keyword>
            <keyword>sudden death of entanglement</keyword>
            <keyword>single-photon transitions</keyword>
            <keyword>thermal field</keyword>
            <keyword>entanglement</keyword>
          </kwdGroup>
        </keywords>
        <files>
          <furl>https://physmath.spbstu.ru/article/2025.82.62/</furl>
          <file/>
        </files>
      </article>
    </articles>
  </issue>
</journal>
