Study of the band structure of GeSiSn/Ge/Si heterostructures by FTIR photoreflectance spectroscopy
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Abstract:
The work demonstrates the use of photomodulation FTIR spectroscopy to study structures containing epitaxial layers of GeSn and GeSiSn in the temperature range of 79−180 K. The photoreflectance method has enabled observation of direct interband transitions, and evaluation of the impact of temperature variation and mechanical strain on their energy values.