The Casimir force pressure onthe dielectric layer in nanoscale solid-state multilayer Al - SiO2 - Si structures

The calculation of the dispersion forces pressure value on the dielectric layer in solid-state multilayer Al - SiO2 - Sistructure widely used in electronic components production is presented. It is shown that the pressure increases sharply in the nanometer range of the dielectric thickness and at the thickness of 1 nm reaches the value of 8 MPa. The calculation results do not depend on the dielectric permittivity model of the structure matters.