A formation method of amorphous and crystalline silicon nanoclusters in dielectric films

Atom physics and physics of clusters and nanostructures
Authors:
Volodin Vladimir A. Korchagina Taisia T.
Abstract:

The method of formation of silicon nanocrystals and amorphous nanoclusters of silicon in the films of nonstoichiometric nitride and silicon oxide on glass and silicon substrates is considered. The method is based on using of nano- and femto- second pulse laser annealings.