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<article article-type="meeting-report" dtd-version="1.3" xml:lang="ru">
  <front>
    <journal-meta>
      <journal-title-group>
        <journal-title>St. Petersburg Polytechnic University Journal: Physics and Mathematics</journal-title>
        <trans-title-group xml:lang="ru">
          <trans-title>Научно-технические ведомости СПбГПУ. Физико-математические науки</trans-title>
        </trans-title-group>
      </journal-title-group>
      <issn pub-type="epub">2304-9782, 2618-8686, 2405-7223</issn>
    </journal-meta>
    <article-meta>
      <article-id pub-id-type="publisher-id">10</article-id>
      <article-id pub-id-type="doi">10.18721/JPM.183.110</article-id>
      <title-group>
        <article-title>Copper deposition onto porous silicon by vacuum thermal evaporation</article-title>
        <trans-title-group xml:lang="ru">
          <trans-title>Осаждение меди на пористом кремнии методом вакуумно-термического напыления</trans-title>
        </trans-title-group>
      </title-group>
      <contrib-group>
        <contrib contrib-type="author">
          <name>
            <surname>Kim</surname>
            <given-names>Kseniya</given-names>
          </name>
          <xref ref-type="aff" rid="aff1"/>
          <email>kmkseniya@yandex.ru</email>
        </contrib>
        <contrib contrib-type="author">
          <contrib-id contrib-id-type="orcid">0009-0005-4323-9163</contrib-id>
          <name>
            <surname>Chernenko</surname>
            <given-names>Sergey</given-names>
          </name>
          <email>sergey.x173@mail.ru</email>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Niftaliev</surname>
            <given-names>Sabukhi</given-names>
          </name>
          <xref ref-type="aff" rid="aff1"/>
          <email>sabukhi@gmail.com</email>
        </contrib>
        <contrib contrib-type="author">
          <contrib-id contrib-id-type="orcid">0009-0000-2880-8958</contrib-id>
          <name>
            <surname>Frolova</surname>
            <given-names>Vera</given-names>
          </name>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Grechkina</surname>
            <given-names>Margarita</given-names>
          </name>
          <xref ref-type="aff" rid="aff2"/>
          <email>grechkina_m@mail.ru</email>
        </contrib>
        <contrib contrib-type="author">
          <contrib-id contrib-id-type="orcid">0000-0002-9850-8341</contrib-id>
          <name>
            <surname>Grigoryan</surname>
            <given-names>Gevorg</given-names>
          </name>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Belokopytov</surname>
            <given-names>Dmitry</given-names>
          </name>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Chukavin</surname>
            <given-names>Andrey</given-names>
          </name>
          <email>andrey_chukawin@mail.ru</email>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Lenshin</surname>
            <given-names>Alexander</given-names>
          </name>
          <xref ref-type="aff" rid="aff1"/>
          <email>lenshinas@mail.ru</email>
        </contrib>
      </contrib-group>
      <aff id="aff1">Voronezh State University of Engineering Technology</aff>
      <aff id="aff2">Voronezh State University</aff>
      <pub-date publication-format="electronic" date-type="pub" iso-8601-date="2025-12-10">
        <day>10</day>
        <month>12</month>
        <year>2025</year>
      </pub-date>
      <volume>18</volume>
      <issue>3.1</issue>
      <fpage>59</fpage>
      <lpage>64</lpage>
      <abstract xml:lang="en">
        <p>The morphology and composition of porous silicon samples with thermally evaporated copper coatings were studied using atomic-force microscopy (AFM), infrared spectroscopy (IR), and X-ray photoelectron spectroscopy (XPS). Our research demonstrated that nanocomposites obtained with this method involve both metallic copper and copper oxide. The results indicate that vacuum thermal deposition of copper promotes efficient penetration of this element into the porous silicon structure and retards the oxidation process of the porous layer during long-term storage in the atmosphere.</p>
      </abstract>
      <kwd-group xml:lang="en">
        <kwd>porous silicon</kwd>
        <kwd>composites</kwd>
        <kwd>thin films</kwd>
        <kwd>copper</kwd>
        <kwd>vacuum-thermal sputtering</kwd>
      </kwd-group>
    </article-meta>
  </front>
</article>
