A method for fabricating an asymmetric planar supercapacitor with dissimilar electrodes based on Super C45/RuO2 and Super C45/MnO2 using the electrophoretic deposition method has been developed. The electrode topology was formed using laser engraving. The electrophoretic deposition method was chosen for deposition of the composite onto the surface of nickel-coated sitall plates. The features of sequential deposition of composite materials onto the substrate surface were studied, as well as the influence of electrophoresis modes on the composition and morphology of the formed electrode layers. The research was conducted to identify the dependence of the capacitance characteristics of the formed electrode materials on the process parameters. A technology for producing compact planar supercapacitors with an asymmetric configuration for a wide range of microelectronics applications has been developed.