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<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Journal Publishing DTD v1.3 20210610//EN" "https://jats.nlm.nih.gov/publishing/1.3/JATS-journalpublishing1-3.dtd">
<article article-type="meeting-report" dtd-version="1.3" xml:lang="ru">
  <front>
    <journal-meta>
      <journal-title-group>
        <journal-title>St. Petersburg Polytechnic University Journal: Physics and Mathematics</journal-title>
        <trans-title-group xml:lang="ru">
          <trans-title>Научно-технические ведомости СПбГПУ. Физико-математические науки</trans-title>
        </trans-title-group>
      </journal-title-group>
      <issn pub-type="epub">2304-9782, 2618-8686, 2405-7223</issn>
    </journal-meta>
    <article-meta>
      <article-id pub-id-type="publisher-id">2</article-id>
      <article-id pub-id-type="doi">10.18721/JPM.163.102</article-id>
      <title-group>
        <article-title>Hall Effect in “size” topological insulators Bi2Se3</article-title>
        <trans-title-group xml:lang="ru">
          <trans-title>Эффект Холла в «размерных» топологических изоляторах Bi2Se3</trans-title>
        </trans-title-group>
      </title-group>
      <contrib-group>
        <contrib contrib-type="author">
          <name>
            <surname>Chistyakov</surname>
            <given-names>Vasiliy</given-names>
          </name>
          <xref ref-type="aff" rid="aff1"/>
          <email>wchist@imp.uran.ru</email>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Perevalova</surname>
            <given-names>Aleksandra</given-names>
          </name>
          <xref ref-type="aff" rid="aff1"/>
          <email>domozhirova@imp.uran.ru</email>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Fominykh</surname>
            <given-names>Bogdan</given-names>
          </name>
          <xref ref-type="aff" rid="aff2"/>
          <email>fominykh@imp.uran.ru</email>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Huang</surname>
            <given-names>J. C. A.</given-names>
          </name>
          <xref ref-type="aff" rid="aff3"/>
          <email>jcahuang@mail.ncku.edu.tw</email>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Marchenkov</surname>
            <given-names>Vyacheslav</given-names>
          </name>
          <xref ref-type="aff" rid="aff2"/>
        </contrib>
      </contrib-group>
      <aff id="aff1">M.N. Mikheev Institute of Metal Physics, UB RAS</aff>
      <aff id="aff2">M.N. Mikheev Institute of Metal Physics; Ural Federal University</aff>
      <aff id="aff3">National Cheng Kung University</aff>
      <pub-date publication-format="electronic" date-type="pub" iso-8601-date="2023-11-29">
        <day>29</day>
        <month>11</month>
        <year>2023</year>
      </pub-date>
      <volume>16</volume>
      <issue>3.1</issue>
      <fpage>16</fpage>
      <lpage>20</lpage>
      <abstract xml:lang="en">
        <p>The Hall resistance ρxy of thin films of the Bi2Se3 topological insulator with a thickness from 10 nm to 75 nm at a temperature of 4.2 K and in magnetic fields up to 10 T has been measured. The size effect was found, i.e. dependence of the Hall resistance and the Hall coefficient on the thickness of the studied films. Using a single-band model, the values of the current carrier concentration and their mobility are calculated, which also change with a change in the thickness of the samples.</p>
      </abstract>
      <kwd-group xml:lang="en">
        <kwd>topological insulators</kwd>
        <kwd>size effect</kwd>
        <kwd>Hall Effect</kwd>
        <kwd>thin films</kwd>
      </kwd-group>
    </article-meta>
  </front>
</article>
