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<article article-type="research-article" dtd-version="1.3" xml:lang="ru">
  <front xmlns:xlink="http://www.w3.org/1999/xlink">
    <journal-meta>
      <journal-title-group>
        <journal-title>St. Petersburg Polytechnic University Journal: Physics and Mathematics</journal-title>
        <trans-title-group xml:lang="ru">
          <trans-title>Научно-технические ведомости СПбГПУ. Физико-математические науки</trans-title>
        </trans-title-group>
      </journal-title-group>
      <issn pub-type="epub">2304-9782, 2618-8686, 2405-7223</issn>
    </journal-meta>
    <article-meta xmlns:xlink="http://www.w3.org/1999/xlink">
      <article-id pub-id-type="publisher-id">14</article-id>
      <article-id pub-id-type="doi">10.18721/JPM.13414</article-id>
      <title-group>
        <article-title>Modification of glass surface by a high electric field</article-title>
        <trans-title-group xml:lang="ru">
          <trans-title>Модификация приповерхностной области стекол высоким электрическим полем</trans-title>
        </trans-title-group>
      </title-group>
      <contrib-group>
        <contrib contrib-type="author">
          <name>
            <surname>Babich</surname>
            <given-names>Ekaterina</given-names>
          </name>
          <xref ref-type="aff" rid="aff1"/>
          <email>babich.katherina@gmail.com</email>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Reduto</surname>
            <given-names>Igor</given-names>
          </name>
          <xref ref-type="aff" rid="aff2"/>
          <email>igor.reduto@uef.fi</email>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Alexey</surname>
            <given-names>V.</given-names>
          </name>
          <xref ref-type="aff" rid="aff3"/>
          <email>red-alex@mail.ru</email>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Reshetov</surname>
            <given-names>Ilya</given-names>
          </name>
          <xref ref-type="aff" rid="aff4"/>
          <email>reshetov_iv@spbstu.ru</email>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Zhurikhina</surname>
            <given-names>Valentina</given-names>
          </name>
          <xref ref-type="aff" rid="aff1"/>
          <email>zhurikhina@mail.edu.ioffe.ru</email>
        </contrib>
        <contrib contrib-type="author">
          <name>
            <surname>Lipovskii</surname>
            <given-names>Andrey</given-names>
          </name>
          <xref ref-type="aff" rid="aff4"/>
          <email>lipovskii@mail.ru</email>
        </contrib>
      </contrib-group>
      <aff id="aff1">Peter the Great St. Petersburg Polytechnic University</aff>
      <aff id="aff2">University of Eastern Finland</aff>
      <aff id="aff3">Institute for Problems of Mechanical Engineering RAS</aff>
      <aff id="aff4">Alferov University</aff>
      <pub-date publication-format="electronic" date-type="pub" iso-8601-date="2020-12-28">
        <day>28</day>
        <month>12</month>
        <year>2020</year>
      </pub-date>
      <volume>13</volume>
      <issue>4</issue>
      <fpage>176</fpage>
      <lpage>184</lpage>
      <self-uri xmlns:xlink="http://www.w3.org/1999/xlink" content-type="pdf" xlink:href="https://physmath.spbstu.ru/userfiles/files/articles/2020/4/14_176-184_13(4)2020.pdf"/>
      <abstract xml:lang="en">
        <p>The work has studied an effect of a high DC field on the composition and properties of the subsurface region of a multicomponent silicate glass. The concentration of alkali ions in the subsurface glass region was shown to drastically decrease under the high electric field. This led to a change in the ion-exchange characteristics of glasses and their resistance to etching. The effect allows employing the poled regions of the glass surface as dielectric masks in the formation of gradient optical structures, as well as relief microstructures, e.g., channels for microfluidics, in glass substrates. The advantage of this approach is that there is no need in multiple lithography using liquid chemicals. This reduces the cost and makes this technological process environment friendly.</p>
      </abstract>
      <kwd-group xml:lang="en">
        <kwd>high electric field</kwd>
        <kwd>chemical etching</kwd>
        <kwd>ion etching</kwd>
        <kwd>ion exchange</kwd>
      </kwd-group>
    </article-meta>
  </front>
</article>
