St. Petersburg Polytechnic University Journal: Physics and Mathematics

Научно-технические ведомости СПбГПУ. Физико-математические науки

2304-9782, 2618-8686, 2405-7223

A formation method of amorphous and crystalline silicon nanoclusters in dielectric films

Способ формирования аморфных и кристаллических нанокластеров кремния в диэлектрических пленках

Korchagina

Taisia

Taisiya999@mail.ru Volodin

Vladimir

volodin@isp.nsc.ru

10 03 2010

66 71

The method of formation of silicon nanocrystals and amorphous nanoclusters of silicon in the films of nonstoichiometric nitride and silicon oxide on glass and silicon substrates is considered. The method is based on using of nano- and femto- second pulse laser annealings.

silicon nanoclusters silicon nitride and silicon oxide films pulse laser annealing